リガクの半導体関連装置

Trace elemental surface contamination metrology by TXRF; up to 200 mm wafers.

Trace elemental surface contamination metrology by TXRF; up to 200 mm wafers.

Trace elemental surface contamination metrology by TXRF; up to 300 mm wafers

Ultra-trace elemental surface contamination metrology by TXRF with VPD capability; up to 300 mm wafers

In-line, simultaneous WDXRF spectrometer for wafer metal film metrology; up to 300 mm wafers

Simultaneous WDXRF spectrometer for wafer metal film metrology; up to 200 mm wafers

Sequential WDXRF spectrometer for elemental analysis and thin-film metrology of large and/or heavy samples

Process XRR, XRF, and XRD metrology tool for blanket and patterned wafers; up to 300 mm wafers

XRF and optical metrology tool for blanket and patterned wafers; up to 300 mm wafers