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リガクの半導体関連装置

 

 

TXRF tools

 

 


全反射蛍光X線分析装置 TXRF 3760

~200mmウェーハのNa~Uまでの汚染元素を極微量で分析。

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全反射蛍光X線分析装置 TXRF 3800e

5×1010 atoms/cm2 の汚染検出を僅か20分で完了。

TXRF 3800e  product image

全反射蛍光X線分析装置 TXRF-V310

遷移金属で106atoms/cm2 レベルの検出下限。

TXRF-V310  product image

全反射蛍光X線分析装置 TXRF 310 Fab

TXRF分析は、すべての製造工程における汚染を測定。

TXRF 310Fab  product image

 

 

XRF tools

 

 


薄膜評価用蛍光X線分析装置 AZX 400

波長分散型蛍光X線分析(WDX)装置の最上位モデル。

AZX 400 wavelength dispersive XRF for large samples

薄膜評価用蛍光X線分析装置 WDA-3650

薄膜の膜厚と組成を、同時に、非破壊、非接触で分析。

WDA-3650  product image

薄膜評価用蛍光X線分析装置 WaferX 310

300mm、200mmウェーハ上の膜厚・組成を、同時に分析。

WaferX 310   product image

X線膜厚・密度測定装置 XHEMIS EX-2000

蛍光X線(XRF)およびX線反射率(XRR)による非接触、非破壊な膜厚・密度測定装置。標準試料なしで膜厚測定が可能

XHEMIS EX-2000

 

 

Combo tools

 

 


インラインX線膜厚・密度モニター MFM 310

パターンウェーハ対応のインライン膜厚・密度モニター。

MFM310   product image

Hybrid XRF and Optical metrology FAB tool Onyx

XRF and optical metrology tool for blanket and patterned wafers; up to 300 mm wafers

Onyx 3000product image

 


Rigaku is a pioneer and world leader in designing and manufacturing X-ray based measurement tools to solve semiconductor manufacturing challenges. With over 25 years of global market leadership in the semiconductor industry, our families of products enable everything from in-fab process control metrology to R&D for thin film and materials characterization. Rigaku specializes in making XRF, XRD and XRR metrology tools to measure critical process parameters like thin film: thickness, composition, roughness, density, porosity, and crystal structure. In addition, we offer process TXRF and VPD-TXRF tools for contamination measurement. With global 24/7 service and support, Rigaku delivers cutting edge solutions for yield enhancement and process development.