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TXRF tools



全反射蛍光X線分析装置 TXRF 3760


TXRF 3760  product image

全反射蛍光X線分析装置 TXRF 3800e

5×1010 atoms/cm2 の汚染検出を僅か20分で完了。

TXRF 3800e  product image

全反射蛍光X線分析装置 TXRF-V310

遷移金属で106atoms/cm2 レベルの検出下限。

TXRF-V310  product image

全反射蛍光X線分析装置 TXRF 310 Fab


TXRF 310Fab  product image



XRF tools



薄膜評価用蛍光X線分析装置 AZX 400


AZX 400 wavelength dispersive XRF for large samples

薄膜評価用蛍光X線分析装置 WDA-3650


WDA-3650  product image

薄膜評価用蛍光X線分析装置 WaferX 310


WaferX 310   product image

X線膜厚・密度測定装置 XHEMIS EX-2000





Combo tools



インラインX線膜厚・密度モニター MFM 310


MFM310   product image

Hybrid XRF and Optical metrology FAB tool Onyx

XRF and optical metrology tool for blanket and patterned wafers; up to 300 mm wafers

Onyx 3000product image


Rigaku is a pioneer and world leader in designing and manufacturing X-ray based measurement tools to solve semiconductor manufacturing challenges. With over 25 years of global market leadership in the semiconductor industry, our families of products enable everything from in-fab process control metrology to R&D for thin film and materials characterization. Rigaku specializes in making XRF, XRD and XRR metrology tools to measure critical process parameters like thin film: thickness, composition, roughness, density, porosity, and crystal structure. In addition, we offer process TXRF and VPD-TXRF tools for contamination measurement. With global 24/7 service and support, Rigaku delivers cutting edge solutions for yield enhancement and process development.