リガクや関連装置での薄膜材料の評価に関する論文リスト（タイトル）です。 2021.12.01 update
OpenAccess の記載ある論文は（無料）ダウンロード可能（ClickにてDOIやurlを参照可）です。（装置名が太字は装置の特長を活用された論文）

論文リスト

Reflectivity (XRR)　【反射率測定】（薄膜論文　タイトル・リスト）

2021年

R-21-1.	“Oxygen vacancy induced phase and conductivity transition of epitaxial BaTiO3−δ films directly grown on Ge (001) without surface passivation” L. Dai, G. Niu, J. Zhao, Y. Xue, R. Luo, B. Chen, R. An, Y. Sun, B. Feng, S. Ding, W. Luo, Z.-G. Ye,and W. Ren Jour. Appl. Phys., vol.129, (2021) 045302-1 – 045302-7 (I-21-02/E-21-01)
R-21-2.	“Optical Plasmon Excitation in Transparent Conducting SrNbO3 and SrVO3 Thin Films” M. Mirjolet, M. Kataja, T.K. Hakala, P. Komissinskiy, L. Alff, G. Herranz, and J. Fontcuberta (OpenAccess)Adv. Optical Mater., (2021) 2100512-1 – 2100512-9 (E-21-05) (https://onlinelibrary.wiley.com/doi/10.1002/adom.202100520)
R-21-3.	“High spin mixing conductance and spin interface transparency at the interface of a Co2Fe0.4Mn0.6Si Heusler alloy and Pt” B.B. Singh, K. Roy, P. Gupta, T. Seki, K. Takanashi, and S. Bedanta (OpenAccess)NPG Asia Mater., vol.13, (2021) 9-1 – 9-10 (https://www.nature.com/articles/s41427-020-00268-7)
R-21-4.	“Rare-earth-free ferrimagnetic Mn4N sub-20 nm thin films as potential hightemperature spintronic material” W. Zhou, C.T. Ma, T.Q. Hartnett, P.V. Balachandran, and S.J. Poon (OpenAccess)AIP Advances, vol.11, (2021) 015334-1 – 015334-6 (https://aip.scitation.org/doi/10.1063/5.0032167)
R-21-5.	“Plasma Enhanced Atomic Layer Deposition of Ruthenium Films using Ru(EtCp)2 Precursor” A. Rogozhin, A. Miakonkikh, E. Smirnova, A. Lomov, S. Simakin, and K. Rudenko (OpenAccess)Coatings, vol.11, (2021) 117-1 – 117-11 (M-21-20) (https://www.mdpi.com/2079-6412/11/2/117)
R-21-6.	“A Highly Strained Phase in PbZr0.2Ti0.8O3 Films with Enhanced Ferroelectric Properties” C. Huang, Z. Liao, M. Li, C. Guan, F. Jin, M. Ye, X. Zeng, T. Zhang, Z. Chen, Y. Qi, P. Gao, and L. Chen (OpenAccess)Adv. Sci., vol.8, (2021) 2003582-1 – 2003582-8 (E-21-16) (https://onlinelibrary.wiley.com/doi/10.1002/advs.202003582)
R-21-7.	“Room-temperature bonded silicon on insulator wafers with a dense buried oxide layer formed by annealing a deposited silicon oxidation layer and surface-activated bonding” Y. Koga, and K. Kurita (OpenAccess)Jpn. Jour. Appl.Phys., vol.60, (2021) 031007-1 – 031007-8 (https://doi.org/10.35848/1347-4065/abe2b9)
R-21-8.	“Anomalous Nernst and Seebeck effects in NiCo2O4 films” H. Koizumi, A. Hidaka, T. Komine, and H. Yanagihara J. Magn. Soc. Jpn., vol.45, (2021) 37 – 40 (E-21-17)
R-21-9.	“Compositional and phase dependence of elastic modulus of crystalline and amorphous Hf1-xZrxO2 thin films” S.S. Fields, D.H. Olson, S.T. Jaszewski, C.M. Fancher, S.W. Smith, D.A. Dickie, G. Esteves, M.D. Henry, P.S. Davids, P.E. Hopkins, and J.F. Ihlefeld Appl. Phys. Lett., vol.118, (2021) 102901-1 – 102901-6 (M-21-28)
R-21-10.	“Properties of indium tin oxide thin films grown by Ar ion beam sputter deposition” C. Bundesmann, J. Bauer, A. Finzel, J.W. Gerlach, W. Knolle, A. Hellmich, and R. Synowicki Jour. Vac. Sci. Technol. –A, vol.39, (2021) 033406-1 – 033406-15 (M-21-31)
R-21-11.	“A hybrid optoelectronic Mott insulator” H. Navarro, J. del Valle, Y. Kalcheim, N.M. Vargas, C. Adda, M.-H. Lee, P. Lapa, A. Rivera-Calzada, I.A. Zaluzhnyy, E. Qiu, O. Shpyrko, M. Rozenberg, A. Frano, and I.K. Schuller Appl. Phys. Lett., vol.118, (2021) 141901-1 – 141901-5 (E-21-23)
R-21-12.	“Direct growth of orthorhombic Hf0.5Zr0.5O2 thin films for hysteresis-free MoS2 negative capacitance field-effect transistors” H.W. Cho, P. Pujar, M. Choi, S. Kang, S. Hong, J. Park, S. Baek, Y. Kim, J. Lee, and S. Kim (OpenAccess)NPJ 2D Mater, Appl., vol.5, (2021) 46-1 – 46-8 (https://www.nature.com/articles/s41699-021-00229-w)
R-21-13.	“Removal of Mo/Si multilayer coatings on fused silica substrates by wet chemical etching” M. Toyoda, R. Yokoyama, S. Waki, T. Kakudate, and J. Chen Appl. Phys. Express, vol.14, (2021) 052003-1 – 052003-5
R-21-14.	“Oxidative molecular layer deposition of PEDOT using volatile antimony(V) chloride oxidant” A.A. Volk, J.-S. Kim, J. Jamir, E.C. Dickey, and G.N. Parsons Jour. Vac. Sci. Technol. -A, vol.39, (2021) 032401-1 – 032401-14 (M-21-41)
R-21-15.	“Atomic layer deposition of chromium oxide - An interplay between deposition and etching” B. Mandol, N. Mahuli, K. Ohno, L. Scudder, and S.K. Sarkar Jour. Vac. Sci. Technol. -A, vol.39, (2021) 032414-1 – 032414-8 (M-21-43)
R-21-16.	“Substrate-Induced Strain Effect on Structural and Magnetic Properties of La0.5Sr0.5CoO3 Films” M. Sánchez-Pérez, J.P. Andrés, J.A. González, R.L. Antón, M.A.L. de la Torre, and O.J. Dura (OpenAccess)Nanomaterials, vol.11, (2021) 781-1 – 781-13 (https://www.mdpi.com/2079-4991/11/3/781)
R-21-17.	“Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition” I.-H. Hwang, M.-J. Kang, H.-Y. Cha, and K.-S. Seo (OpenAccess)Crystals, vol.11, (2021) 405-1 – 405-11 (E-21-30) (https://www.mdpi.com/2073-4352/11/4/405)
R-21-18.	“Control of Structural and Magnetic Properties of Polycrystalline Co2FeGe Films via Deposition and Annealing Temperatures” A. Vovk, S.A. Bunyaev, P. Štrichovanec, N.R. Vovk, B. Postolnyi, A. Apolinario, J.Á. Pardo, P.A. Algarabel, G.N. Kakazei, and J.P. Araujo (OpenAccess)Nanomaterials, vol.11, (2021) 1229-1 – 1229-14 (M-21-52) (https://www.mdpi.com/2079-4991/11/5/1229)
R-21-19.	“Microstructure and mechanical properties of atomic layer deposited alumina doped zirconia” H.-M. Piirsoo, T. Jõgiaas, H. Mändar, P. Ritslaid, K. Kukli, and A. Tamm (OpenAccess)AIP Advances, vol.11, (2021) 055316-1 – 055316-8 (M-21-58) (https://aip.scitation.org/doi/10.1063/5.0047572)
R-21-20.	“Thickness-dependent optical properties of aluminum nitride films for mid-infrared wavelengths” L.Y. Beliaev, E. Shkondin, A.V. Lavrinenko, and O. Takayama Jour. Vac. Sci. Technol. –A, vol.39, (2021) 043408-1 – 043408-9 (M-21-59)
R-21-21.	“X-ray scattering profiles: revealing the porosity gradient in porous silicon” C. Romanitan, P. Varasteanu, D.C. Culita, A. Bujora, and O. Tutunaru Jour. Appl. Cryst., vol.54, (2021) 847 – 855 (M-21-61)
R-21-22.	“Electrodeposition of Ru onto Ru and Au Seed Layers from Solutions of Ruthenium Nitrosyl Sulfate and Ruthenium Chloride” R. Gusley, Q. Cumston, K.R. Coffey, A.C. West and K. Barmak (OpenAccess)J. Electrochem. Soc., vol.168, (2021) 052504-1 – 052504-9 (M-21-65) (https://pubs.acs.org/doi/10.1021/acsomega.0c05619)
R-21-23.	“Aluminum Oxide at the Monolayer Limit via Oxidant-Free plasma-Assisted Atomic Layer Deposition on GaN” A. Henning, J.D. Bartl, A. Zeidler, S. Qian, O. Bienek, C.-M. Jiang, C. Paulus, B. Rieger, M. Stutzmann, and I.D. Sharp (OpenAccess)Adv. Funct. Mater., (2021) 2101141-1 – 2101141-10 (M-21-74) (https://onlinelibrary.wiley.com/doi/10.1002/adfm.202101441)
R-21-24.	“An antisite defect mechanism for room temperature ferroelectricity in orthoferrites” S. Ning, A. Kumar, K. Klyukin, E. Cho, J.H. Kim, T. Su, H.-S. Kim, J.M. LeBeau, B. Yildiz, and C.A. Ross (OpenAccess)Nat. Commun., vol.12, (2021) 4298-1 – 4298-7 (E-21-44) (https://www.nature.com/articles/s41467-021-24592-w)
R-21-25.	“Structural characterization and magnetic response of poly(p‑xylylene)–MnSb and MnSb films deposited at cryogenic temperature” L.N. Oveshnikov, S.A. Zav’yalov, I.N. Trunkin, D.R. Streltsov, N.K. Chumakov, P.V. Dmitryakov, G.V. Prutskov, O.A. Kondratev, A.A. Nesmelov, and S.N. Chvalun (OpenAccess)Sci. Reports, vol.16, (2021) 16004-1 – 16004-13 (M-21-91) (https://www.nature.com/articles/s41598-021-95475-9)
R-21-26.	“The Effect of the Deposition Method on the Structural and Optical Properties of ZnS Thin Films” I.-D. Simandan, F. Sava, A.-T. Buruiana, I. Burducea, N. Becherescu, C. Mihai, A. Velea, and A.-C. Galca (OpenAccess)Coatings, vol.11, (2021) 1064-1 – 1064-12 (M-21-100) (https://www.mdpi.com/2079-6412/11/9/1064)
R-21-27.	“Synthesis and Characterization of Cu2ZnSnS4 Thin Films Obtained by Combined Magnetron Sputtering and Pulsed Laser Deposition” M.-Y. Zaki, F. Sava, A.-T. Buruiana, I.-D. Simandan, N. Becherescu, A.-C. Galca, C. Mihai, and A. Velea (OpenAccess)Nanomaterials, vol.11, (2021) 2403-1 – 2403-13 (M-21-102) (https://www.mdpi.com/2079-4991/11/9/2403)
R-21-28.	“Uncovering the out-of-plane nanomorphology of organic photovoltaic bulk heterojunction by GTSAXS” X. Xia, T.-K. Lau, X. Guo, Y. Li, M. Qin, K. Liu, Z. Chen, X. Zhan, Y. Xiao, P.F. Chan, H. Liu, L. Xu, G. Cai, N. Li, H. Zhu, G. Li, Y. Zhu, T. Zhu, X. Zhan, X.-L. Wang, and X. Lu (OpenAccess)Nat. Commun., vol.6, (2021) 6226-1 – 6226-10 (https://www.nature.com/articles/s41467-021-26510-6)
R-21-29.	“Engineering of Fe-pnictide heterointerfaces by electrostatic principles” S. Haindl, S. Nikolaev, M. Sato, M. Sasase, and I. MacLaren (OpenAccess)NPG Asia Mater., vol.13, (2021) 67-1 – 67-10 (E-21-64) (https://www.nature.com/articles/s41427-021-00336-6)
R-21-30.	“Electrical properties of high permittivity epitaxial SrCaTiO3 grown on AlGaN/GaN heterostructures” E.N. Jin, B.P. Downey, V.J. Gokhale, J.A. Roussos, M.T. Hardy, T.A. Growden, N. Nepal, D.S. Katzer, J.P. Calame, and D.J. Meyer (OpenAccess)APL Mater., vol.9, (2021) 111101-1 – 111101-9 (E-21-68) (https://aip.scitation.org/doi/10.1063/5.0063295)
R-21-31.	“Growth of the intrinsic superlattice material Bi4Se3 by DC magnetron sputtering: Layered to faceted growth” J.P. Corbett, M.M. Brown, T.C. Muratore, R.P. Laing, J.L. Brown, J.A. Gupta, and A.N. Reed Jour. Vac. Sci. Technol. -A, vol.39, (2021) 063412-1 – 063412-8 (M-21-132)

2020年

R-20-1..	“Interlayer exchange coupling and interface magnetic anisotropy with crossed in-plane and perpendicular magnetic anisotropies” H. Koizumi, M. Higahara, S. Kobayashi, and H. Yanagihara (OpenAccess) AIP Advances, vol.10, (2020) 015108-1 – 015108-4 (E-20-04)(https://aip.scitation.org/doi/10.1063/1.5129564)
R-20-2..	“Understanding the role of rf-power on AlN film properties in hollow-cathode plasmaassisted atomic layer deposition” S. Ilhom, D. Shukla, A. Mohammad, J. Grasso, B. Willis, and N. Biyikli Jour. Vac. Sci. Technol. -A, vol.38, (2020) 022405-1 – 022405-8 (M-20-15)
R-20-3..	“Strong correlation between uniaxial magnetic anisotropic constant and in-plane tensile strain in Mn4N epitaxial films” T. Hirose, T. Komori, T. Gushi, A. Anzai, K. Toko, and T. Suemasu (OpenAccess) AIP Advances, vol.10, (2020) 025117-1 – 025117-6 (I-20-4,E-20-11)(https://aip.scitation.org/doi/10.1063/1.5141818)
R-20-4..	“Thickness-dependent microstructural properties of heteroepitaxial (00.1) CuFeO2 thin films on (00.1) sapphire by pulsed laser deposition” S. Luo, A. Fluri, S. Zhang, X. Liu, M. Döbeli, G.F. Harrington, R. Tu, D. Pergolesi, T. Ishihara, and T. Lippert Jour. Appl. Phys., vol.127, (2020) 065301-1 – 065301-10 (E-20-15)
R-20-5..	“Oxygen diffusion barriers for epitaxial thinfilm heterostructures with highly conducting SrMoO3 electrodes” P. Salg, L. Zeinar, A. Radetinac, D. Walk, H. Maune, R. Jakoby, L. Alff, and P. Komissinskiy Jour. Appl. Phys., vol.127, (2020) 065302-1 – 065302-7 (E-20-16)
R-20-6..	“Topography dependence of the metamagnetic phase transition in FeRh thin films” J.L. Warren, C.W. Barton, C. Bull, and T. Thomson (OpenAccess) Sci. Reports, vol.10, (2020) 4030-1 – 4030-10 (M-20-27)(https://www.nature.com/articles/s41598-020-60767-z)
R-20-7..	“Ozone based high-temperature atomic layer deposition of SiO2 thin films” S.M. Hwang, Z. Qin, H.S. Kim, A. Ravichandran, Y.C. Jung, S.J. Kim, J. Ahn, B.K. Hwang, and J. Kim Jpn. Jour. Appl. Phys., vol.59, (2020) SIIG05-1 – SIIG05-5
R-20-8..	“Role of temperature on structure and electrical properties of titanium nitride films grown by low pressure plasma enhanced atomic layer deposition” I. Krylov, Y. Qi, V. Korchnoy, K. Weinfeld, M. Eizenberg, and E. Yalon Jour. Vac. Sci. Technol. -A, vol.38, (2020) 032403-1 – 032403-6 (M-20-31)
R-20-9..	“Correlation between SiO2 growth rate and difference in electronegativity of metal–oxide underlayers for plasma enhanced atomic layer deposition using tris(dimethylamino)silane precursor” E. Maeda, T. Nabatame, M. Hirose, M. Inoue, A. Ohi, N. Ikeda, and H. Kiyono Jour. Vac. Sci. Technol. -A, vol.38, (2020) 032409-1 – 032409-6
R-20-10..	“Detection of decoupled surface and bulk states in epitaxial orthorhombic SrIrO3 thin films” P.E. Evans, T. Komesu, L. Zhang, D.-F. Shao, A.J. Yost, S. Kumar, E.F. Schwier, K. Shimada, E.Y. Tsymbal, X. Hong, and P.A. Dowben (OpenAccess) AIP Advances, vol.38, (2020) 032403-1 – 032403-6 (E-20-26)(https://aip.scitation.org/doi/10.1063/1.5135941)
R-20-11..	“Tunable magnetoelastic anisotropy in epitaxial (111) Tm3Fe5O12 thin films” N.M. Vu, P.B. Meisenheimer, and J.T. Heron Jour. Appl. Phys., vol.127, (2020) 153905-1 – 153905-6 (E-20-27)
R-20-12..	“Effect of post-deposition annealing on electrical properties and structures of aluminum oxide passivation film on a crystalline silicon substrate” K. Arafune, S. Kitano, H. Yoshida, A. Ogura, and Y. Hotta Jpn. Jour. Appl. Phys., vol.58, (2020) 125502-1 – 125502-5
R-20-13..	“Evidence of Biorealistic Synaptic Behavior in Diffusive Li-based Two-terminal Resistive Switching Devices” P.S. Ioannou, E. Kyriakides, O. Schneegans, and J. Giapintzakis (OpenAccess) Sci. Reports, vol.10, (2020) 8711-1 – 8711-10 (M-20-42)(https://www.nature.com/articles/s41598-020-65237-0)
R-20-14..	“Epitaxial growth of SrCaTiO3 films on GaN by molecular beam epitaxy with a TiO2 buffer layer” E.N. Jin, A.C. Lang, M.T. Hardy, N. Nepa, D.S. Katzer, D.F. Storm, B.P. Downey, and D.J. Meyer Jour. Appl. Phys., vol.127, (2020) 214104-1 – 214104-8 (E-20-30)
R-20-15..	“Factors limiting carrier transport of ultrathin W-doped In2O3 films” Y. Furubayashi, M. Maehara, and T. Yamamoto J. Phys. D: Appl. Phys., vol.53, (2020) 375103-1 – 375103-7 (M-20-63)
R-20-16..	“Evolution of ferroelectricity in ultrathin PbTiO3 films as revealed by electric double layer gating” R. Nishino, T.C. Fujita, F. Kagawa and M. Kawasaki (OpenAccess) Sci. Reports, vol.10, (2020) 10864-1 – 10864-8 (E-20-40)(https://www.nature.com/articles/s41598-020-67580-8)
R-20-17..	“Interfacial charge and strain effects on lanthanum doped barium stannate thin film under ferroelectric gating” J. Cui, J. Wang, H. Huang, Z. Zhao, Y. Yang, Y. Zhang, Z. Fu, and Y. Lu Appl. Phys. Lett., vol.117, (2020) 012101-1 – 012101-5 (E-20-41)
R-20-18..	“Enhancement of perpendicular magnetic anisotropy and Dzyaloshinskii–Moriya interaction in thin ferromagnetic films by atomic-scale modulation of interfaces” A.S. Samardak, A.V. Davydenko, A.G. Kolesnikov, A.Y. Samardak, A.G. Kozlov, B. Pal, A.V. Ognev, A.V. Sadovnikov, S.A. Nikitov, A.V. Gerasimenko, I.H. Cha, Y.J. Kim, G.W. Kim, O.A. Tretiakov, and Y.K. Kim (OpenAccess) NPG Asia Mater., vol.12, (2020) 51-1 – 51-11 (E-20-44)(https://www.nature.com/articles/s41427-020-0232-9#Sec9)
R-20-19..	“Elucidating the role of nitrogen plasma composition in the low-temperature self-limiting growth of indium nitride thin films” S. Ilhom, A. Mohammad, D. Shukla, J. Grasso, B.G. Willis, A.K. Okyay, and N. Biyikli (OpenAccess) RSC Adv., vol.10 (2020) 27357 – 27368 (M-20-74)(https://pubs.rsc.org/en/content/articlelanding/2020/ra/d0ra04567e)
R-20-20..	“Controlling Atomic Layer Deposition of 2D Semiconductor SnS2 by the Choice of Substrate” M. Mattinen, P.J. King, P. Brüner, M. Leskelä, and M. Ritala (OpenAccess) Adv. Mater. Interfaces, vol.7, (2020) 2001046-1 – 2001046-10 (I-20-09,M-20-82)(https://onlinelibrary.wiley.com/doi/10.1002/admi.202001046)
R-20-21..	“Experimental and theoretical evidence for hydrogen doping in polymer solution-processed indium gallium oxide” W. Huang, P.-H. Chie, K. McMillen, S. Patel, J. Tedesco, L. Zeng, S. Mukherjee, B. Wang, Y. Chen, G. Wang, Y. Wang, Y. Gao, M.J. Bedzyk, D.M. DeLongchamp, Y.-Y. Hu, J.E. Medvedeva, T.J. Marks, and A. Facchetti (OpenAccess) PNAS., vol.117, (2020) 18231 – 18239 (M-20-83)(https://www.pnas.org/content/117/31/18231)
R-20-22..	“Printable Organic-Inorganic Nanoscale Multilayer Gate Dielectrics for Thin-Film Transistors Enabled by a Polymeric Organic Interlayer” Y. Chen, X. Zhuang, E.A. Goldfine, V.P. Dravid, M.J. Bedzyk, W. Huang, A. Facchetti, and T.J. Marks Adv. Funct. Mater., vol.30, (2020) 2005069-1 – 2005069-11
R-20-23..	“Magnetic and transport properties of amorphous, B2 and L21 Co2MnGa thin films” Z. Zhu, T. Higo, S. Nakatsuji, and Y. Ohtani (OpenAccess) AIP Advances, vol.10, (2020) 085020-1 – 085020-7 (E-20-49)(https://aip.scitation.org/doi/10.1063/5.0018640)
R-20-24..	“Orientation and crystal structure of two-dimensional carbon nitride films” H. Habuchi, and R. Kobayashi Jpn. Jour. Appl. Phys., vol.59, (2020) 080907-1 – 080907-4 (I-20-10,M-20-91)
R-20-25..	“Tailoring the Switching Dynamics in Yttrium Oxide-Based RRAM Devices by Oxygen Engineering: From Digital to Multi-Level Quantization toward Analog Switching” S. Petzold, E. Piros, R. Eilhardt, A. Zintler, T. Voge, N. Kaiser, A. Radetinac, P. Komissinskiy, E. Jalaguier, E. Nolot, C. Charpin-Nicolle, C. Wenger, L. Molina-Luna, E. Miranda, and L. Alff (OpenAccess) Adv. Electron. Mater., vol.6, (2020) 2000439-1 – 2000439-13 (M-20-95)(https://onlinelibrary.wiley.com/doi/10.1002/aelm.202000439)
R-20-26..	“Structure–Charge Transport Relationships in Fluoride-Doped Amorphous Semiconducting Indium Oxide: Combined Experimental and Theoretical Analysis” A. Sil, L. Avazpour, E.A. Goldfine, Q. Ma, W. Huang, B. Wang, M.J. Bedzyk, J.E. Medvedeva, A. Facchetti, and T.J. Marks Chem. Mater., vol.32, (2020) 805 – 820 (M-20-96)
R-20-27..	“Epitaxial niobium nitride superconducting nanowire single-photon detectors” R. Cheng, J. Wright, H.G. Xing, D. Jena, and H.X. Tang Appl. Phys. Lett., vol.117, (2020) 132601-1 – 132601-5 (E-20-56)
R-20-28..	“Combinatorial Approach for Single-Crystalline TaON Growth: Epitaxial β‑TaON (100)/α-Al2O3 (012)” K.V.L.V. Narayanachari, D.B. Buchholz, E.A. Goldfine, J.K. Wenderott, S.M. Haile, and M.J. Bedzyk ACS Appl. Electron. Mater., vol.2, (2020) 3571 – 3576 (E-20-57)
R-20-29..	“異種材料接合界面制御：金属酸化物低温成膜と高キャリア輸送” 山本哲也・古林寛セラミックス., vol.55, (2020) 750 – 753 (M-20-102)
R-20-30.	“Heteroepitaxial growth of β-Ga2O3 films on SiC via molecular beam epitaxy” N. Nepal, D. Scott Katzer, B.P. Downey, V.D. Wheeler, L.O. Nyakiti, D.F. Storm, M.T. Hardy, J.A. Freitas, E.N. Jin, D. Vaca, L. Yates, S. Graham, S. Kumar, and D.J. Meyer Jour. Vac. Sci. Technol. -A, vol.38, (2020) 063406-1 – 063406-8 (E-20-62)
R-20-31.	“Area-Selective Growth of HfS2 Thin Films via Atomic Layer Deposition at Low Temperature” Y. Cao, T. Wähler, H. Park, J. Will, A. Prihoda, N.M. Badlyan, L. Fromm, T. Yokosawa, B. Wang, D.M. Guldi, A. Görling, J. Maultzsch, T. Unruh, E. Spiecker, M. Halik, J. Libuda, and J. Bachmann (OpenAccess) Adv. Mater. Interfaces, (2020) 2001493-1 – 2001493-9(https://onlinelibrary.wiley.com/doi/10.1002/admi.202001493)
R-20-32.	“Effect of post-deposition annealing on electrical properties and structures of aluminum oxide passivation film on a crystalline silicon substrate” K. Arafune, S. Kitano, H. Yoshida, A. Ogura, and Y. Hotta Jpn. Jour. Appl. Phys., vol.58, (2020) 125502-1 – 125502-5
R-20-33.	“Structure and behavior of ZrO2-graphene-ZrO2 stacks” T. Kahro, H. Castán, S. Dueñas, J. Merisalu, J. Kozlova, T. Jõgiaas, H.-M. Piirsoo, A. Kasikov, P. Ritslaid, H. Mändar, A. Tarre, A. Tamm, and K. Kukli Jour. Vac. Sci. Technol. –A, vol.38, (2020) 063411-1 – 063411-10 (M-20-115)
R-20-34.	“Platinum Sputtered on Nb-doped TiO2 Films Prepared by ALD: Highly Active and Durable Carbon-free ORR Electrocatalyst” S. Hussain, H. Erikson, N. Kongi, A. Tarre, P. Ritslaid, A. Kikas, V. Kisand, J. Kozlova, J. Aarik, A. Tamm, V. Sammelselg, and K. Tammeveski (OpenAccess) Jour. Electrochem. Soc., vol.167, (2020) 164505-1 – 164505-8 (M-20-124)(https://iopscience.iop.org/article/10.1149/1945-7111/abcbb4)
R-20-35.	“Enhanced image sensing with avalanche multiplication in hybrid structure of crystalline selenium photoconversion layer and CMOSFETs” S. Imura, K. Mineo, Y. Honda, T. Arai, K. Miyakawa, T. Watabe, M. Kubota, K. Nishimoto, M. Sugiyama, and M. Nanba (OpenAccess) Sci. Reports, vol.10, (2020) 21888-1 – 21888-9(https://www.nature.com/articles/s41598-020-78837-7)
R-20-36.	“Depth selective magnetic phase coexistence in FeRh thin films” W. Griggs, B. Eggert, M.O. Liedke, M. Butterling, A. Wagner, U. Kentsch, E. Hirschmann, M. Grimes, A.J. Caruana, C. Kinane, H. Wende, R. Bali, and T. Thomson (OpenAccess) APL Mater., vol.8, (2020) 121103-1 – 121103-12 (M-20-131)(https://aip.scitation.org/doi/10.1063/5.0032130)
R-20-37.	“Atomic Layer Deposition of Superconducting CuO Thin Films on Three-Dimensional Substrates” A. Tamm, A. Tarre, V. Verchenko, H. Seemen, and R. Stern (OpenAccess) Crystals, vol.10, (2020) 650-1 – 650-9 (M-20-132)(https://www.mdpi.com/2073-4352/10/8/650)
R-20-38.	“Impact of Surface Chemistry and Doping Concentrations on Biofunctionalization of GaN/Ga-In-N QuantumWells” N. Naskar, M.F. Schneidereit, F. Huber, S. Chakrabortty, L. Veith, M. Mezger, L. Kirste, T. Fuchs, T. Diemant, T. Weil, R.J. Behm, K. Thonke, and F. Scholz (OpenAccess) Sensors, vol.20, (2020) 4179-1 – 4179-19(https://www.mdpi.com/1424-8220/20/15/4179)

2019年

R-19-01	“Large negative uniaxial magnetic anisotropy in highly distorted Co-ferrite thin films” T. Tainosho, J. Inoue, S. Sharmin, M. Takeguchi, E. Kita, and H. Yanagihara Appl. Phys. Lett., vol.114, (2019) 092408-1 – 092408-5 (E-19-04, I-19-06)
R-19-02	“MoS2 thin films from a (NtBu)2(NMe2)2Mo and 1-propanethiol atomic layer deposition process” B. Kalanyan, R. Beams, M.B. Katz, A.V. Davydov, J.E. Maslar, and R.K. Kanjolia Jour. Vac. Sci. Technol., -A vol.37, (2019) 010901-1 – 010901-11
R-19-03	“Understanding the effect of nitrogen plasma exposure on plasma assisted atomic layer epitaxy of InNmonitored by real time grazing incidence small angle x-ray scattering” N. Nepal, V.R. Anderson, S.D. Johnson, B.P. Downey, D.J. Meyer, Z.R. Robinson, J.M. Woodward, K.F. Ludwig, and C.R. Eddy Jour. Vac. Sci. Technol., -A vol.37, (2019) 020901-1 – 020901-9
R-19-04	“Comparative study on the use of novel heteroleptic cyclopentadienyl-based zirconium precursors with H2O and O3 for atomic layer deposition of ZrO2” S. Seppälä, M. Vehkamäki, K. Mizohata, W. Noh, J. Räisänen, M. Ritala, and M. Leskelä Jour. Vac. Sci. Technol., -A vol.37, (2019) 020912-1 – 020912-8
R-19-05	“Structural and antiferromagnetic characterization of noncollinear D019 Mn3Ge polycrystalline film” T. Ogasawara, J. Kim, Y. Ando, and A. Hirohata (OpenAccess) Jour. Magn. Magn. Mater., vol.473, (2019) 7 – 11 (M-19-09) (https://www.sciencedirect.com/science/article/pii/S0304885318323515?via%3Dihub)
R-19-06	“Effect of Surface Chemical Bonding States on Lithium Intercalation Properties of Surface-Modified Lithium Cobalt Oxide” J. Hata, M. Hirayama, K. Suzuki, N. Dupré, D. Guyomard, and R. Kanno Batteries and Supercaps, vol.2, (2019) 454 – 463 (M-19-10)
R-19-07	“Dependence of relationship between chemical gradient and line width roughness of zirconia nanoparticle resist on pattern duty, acid generator, and developer” T. Kozawa, A. Nakajima, T. Yamada, Y. Muroya, J.J. Santillan, and T. Itani Jpn. Jour. Appl. Phys., vol.58, (2019) 036501-1 – 036501-7
R-19-08	“Crystalline tungsten sulfide thin films by atomic layer deposition and mild annealing” M. Mattinen, T. Hatanpää, P.J. King, K. Meinander, K. Mizohata, P. Jalkanen, J. Räisänen, M. Ritala, and M. Leskelä Jour. Vac. Sci. Technol., -A vol.37, (2019) 020921-1 – 020921-9 (M-19-34)
R-19-09	“Structural properties of strained epitaxial La1+δCrO3 thin films” D. Han, M. Bouras, C. Botella, A. Benamrouche, B. Canut, G. Grenet, G. Saint-Girons, and R. Bachelet Jour. Vac. Sci. Technol., -A vol.37, (2019) 021512-1 – 021512-6 (E-19-12)
R-19-10	“Phase transitions in few-monolayer spin ice films” L. Bovo, C.M. Rouleau, D. Prabhakaran, and S.T. Bramwell (OpenAccess) Nat. Commun., vol.10, (2019) 1219-1 – 1219-8 (E-19-16) (https://www.nature.com/articles/s41467-019-09187-w)
R-19-11	“Effects of deposition temperature on growth and properties of pulsed laser deposited VO2 thin films and nanostructures” K. Mulchandani, A. Soni, and K.R. Mavani AIP Cof. Proc., vol.2100, (2019) 020051-1 – 020051-3 (M-19-47)
R-19-12	“Strain-effected physical properties of ferromagnetic insulating La0.88Sr0.12MnO3 thin films” Y. Kim, S. Ryu, and H. Jeen (OpenAccess) RSC Adv., vol.9, (2019) 2645-1 – 2645-5 (E-19-24) (https://pubs.rsc.org/en/content/articlelanding/2019/RA/C8RA09851D#!divAbstract)
R-19-13	“High-performance thin H:SiON OLED encapsulation layer deposited by PECVD at low temperature” K.W. Park, S. Lee, H Lee, Y-H Cho, YC Park, S.G. Im, and S.-H.K. Park (OpenAccess) RSC Adv., vol.9, (2019) 58-1 – 58-7 (https://pubs.rsc.org/en/content/articlelanding/2019/RA/C8RA08449A#!divAbstract)
R-19-14	“Thickness dependence of the physical properties of atomic-layer deposited Al2O3” Y. Etinger-Geller, E. Zoubenko, M. Baskin, L. Kornblum, and B. Pokroy Jour. Appl. Phys., vol.125, (2019) 185302-1 – 185302-6
R-19-15	“Thickness dependent magneto-static and magneto-dynamic properties of CoFeB thin films” A. Gayen, R. Modak, A. Srinivasan, V.V. Srinivasu, and P. Alagarsamy Jour. Vac. Sci. Technol., -A vol.37, (2019) 031513-1 – 031513-10
R-19-16	“Polymer Doping Enables a Two-Dimensional Electron Gas for High-Performance Homojunction Oxide Thin-Film Transistors” Y. Chen, W. Huang, V.K. Sangwan, B. Wang, L. Zeng, G. Wang, Y. Huang, Z. Lu, M.J. Bedzyk, M.C. Hersam, and T.J. Marks Adv. Mat., vol.31, (2019) 1085082-1 – 1085082-8 (M-19-48)
R-19-17	“Expeditious, scalable solution growth of metal oxide films by combustion blade coating for flexible electronics” B. Wang, P. Guo, L. Zeng, X. Yu, A. Sil, W. Huang, M.J. Leonardi, X. Zhang, G. Wang, S. Lu, Z. Chen, M.J. Bedzy, R.D. Schaller T.J Marks, and A. Facchettis PNAS., (2019) 1901492116-1 – 1901492116-9 (M-19-49)
R-19-18	“Measuring thickness in thin NbN films for superconducting devices” O. Medeiros, M. Colangelo, I. Charaev, and K.K. Berggren Jour. Vac. Sci. Technol., -A vol.37, (2019) 041501-1 – 041501-5
R-19-19	“Direct Comparison of PdAu Alloy Thin Films and Nanoparticles upon Hydrogen Exposure” L.J. Bannenberg, F.A.A. Nugroho, H. Schreuders, B. Norder, T.T. Trinh, N.-J. Steinke, A.A. van Well, C. Langhammer, and B. Dam (OpenAccess) ACS Appl. Mater. Interfaces, vol.11, (2019) 15489 – 15497 (https://pubs.acs.org/doi/10.1021/acsami.8b22455)
R-19-20	“Wear-resistive and electrically conductive nitrogen-containing DLC film consisting of ultra-thin multilayers prepared by using filtered arc deposition” T. Harigai, K. Tamekuni, Y. Iijima, S. Degai, T. Tanimoto, Y. Suda, H. Takikawa, S. Takago, H. Yasui, S. Kaneko, S. Kunitsugu, H. Habuchi, M. Kamiya, M. Taki, and H. Gonda Jpn. Jour. Appl. Phys., vol.58, (2019) SEED05-1 – SEED05-5
R-19-21	“Effect of thickness on metal to semiconductor transition in La doped BaSnO3 films deposited on high mismatch LSAT substrates” A. Kumar, S. Maurya, S. Chawla, S. Patwardhan, and B. Kavaipatti Appl. Phys. Lett., vol.114, (2019) 212103-1 – 212103-5 (E-19-25)
R-19-22	“Exceptional fracture resistance of ultrathin metallic glass films due to an intrinsic size effect” O. Glushko, M. Mühlbacher, C. Gammer, M.J. Cordill, C. Mitterer, and J. Eckert (OpenAccess) Sci. Reports, vol.9, (2019) 8281-1 – 8281-9 (M-19-51) (https://www.nature.com/articles/s41598-019-44384-z)
R-19-23	“Anatomy of the energetic driving force for charge generation in organic solar cells” K. Nakano, Y. Chen, B. Xiao, W. Han, J. Huang, H. Yoshida, E. Zhou, and K. Tajima (OpenAccess) Nat. Commun., vol.10, (2019) 2520-1 – 2520-10 (https://www.nature.com/articles/s41467-019-10434-3)
R-19-24	“Intercalation of Lithium Ions from Gaseous Precursors into β‑MnO2 thin Films Deposited by Atomic Layer Deposition” H.-E. Nieminen, V. Miikkulainen, D. Settipani, L. Simonelli, P. Hönicke, C. Zech, Y. Kayser, B. Beckhoff, A.-P. Honkanen, M.J. Heikkilä, K. Mizohata, K. Meinander, O.M.E. Ylivaara, S. Huotari, and M. Ritala (OpenAccess) Jour. Chem. Phys., -C, vol.123, (2019) 15802-1 – 15802-13 (I-19-09) (https://pubs.acs.org/doi/abs/10.1021/acs.jpcc.9b03039)
R-19-25	“Dual ion beam grown silicon carbide thin films: Variation of refractive index and bandgap with film thickness” A. Mathur, D. Pal, A. Singh, R. Singh, S. Zollner, and S. Chattopadhyay Jour. Vac. Sci. Technol., -B vol.37, (2019) 041802-1 – 041802-11 (M-19-58)
R-19-26	“Atomic Layer Deposition of Emerging 2D Semiconductors, HfS2 and ZrS2, for Optoelectronics” M. Mattinen, G. Popov, M. Vehkamäki, P.J. King, K. Mizohata, P. Jalkanen, J. Räisänen, M. Leskelä, and M. Ritala (OpenAccess) Chem. Mater., vol.31, (2019) 5713 – 5724 (I-19-12,M-19-67) (https://pubs.acs.org/doi/10.1021/acs.chemmater.9b01688)
R-19-27	“Amorphous sulfide heterostructure precursors prepared by radio frequency sputtering” D.M. Roberts, J.D. Perkins, A.G. Norman, C.R. Stoldt, A. Zakutayev, and S.R. Bauersa Jour. Vac. Sci. Technol., -B vol.37, (2019) 051201-1 – 01201-8
R-19-28	“Forming-Free Grain Boundary Engineered Hafnium Oxide Resistive Random Access Memory Devices” S. Petzold, A. Zintler, R. Eilhardt, E. Piros, N. Kaiser, S.U. Sharath, T. Vogel, M. Major, K.P. McKenna, L. Molina-Luna, and L. Alff (OpenAccess) Adv. Electron. Mater., vol.5, (2019) 1900484-1 – 1900484-9 (E-19-39) (https://onlinelibrary.wiley.com/doi/full/10.1002/aelm.201900484)
R-19-29	“In-plane and perpendicular exchange bias effect induced by an antiferromagnetic D019 Mn2FeGa thin film” T. Ogasawara, E. Jackson, M. Tsunoda, Y. Ando, and A. Hirohata (OpenAccess) Jour. Magn. Magn, Mater., vol.484, (2019) 307 – 312 (M-19-72) (https://www.sciencedirect.com/science/article/pii/S0304885319308418?via%3Dihub)
R-19-30	“The effects of small amounts of oxygen during deposition on structural changes in sputtered HfO2-based films” K. Takada, Y. Saho, T. Yoshimura, and N. Fujimura Jpn. Jour. Appl. Phys., vol.58, (2019) SLLB03-1 – SLLB03-4 (M-19-73)
R-19-31	“Poisson ratio and bulk lattice constant of (Sr0.25La0.75)CrO3 from strained epitaxial thin films” D. Han, M. Bouras, C. Botella, A. Benamrouche, B. Canut, G. Grenet, G. Saint-Girons, and R. Bachelet Jour. Appl. Phys., vol.126, (2019) 085304-1 – 085304-7 (E-19-42)
R-19-32	“Using structural phase transitions to enhance the coercivity of ferromagnetic films” R.F. Need, J. Lauzier, L. Sutton, B.J. Kirby, and J. de la Venta (OpenAccess) APL Mater., vol.7, (2019) 101115-1 – 101115-6 (M-19-85) (https://aip.scitation.org/doi/10.1063/1.5118893)
R-19-33	“Effect of post-deposition annealing on electrical properties and structures of aluminum oxide passivation film on a crystalline silicon substrate” K. Arafune, S. Kitano, H. Yoshida, A. Ogura, and Y. Hotta Jpn. Jour. Appl. Phys., vol.58 (2019) 125502-1 – 125502-5
R-19-34	“Mechanically controlled reversible photoluminescence response in all-inorganic flexible transparent ferroelectric/mica heterostructures” M. Zheng, H. Sun, and K.W. Kwok (OpenAccess) NPG Asia Mater., vol.11, (2019) 52-1 – 52-8 (E-19-48) (https://www.nature.com/articles/s41427-019-0153-7)
R-19-35	“Three port logic gate using forward volume spin wave interference in a thin yttrium iron garnet film” T. Goto, T. Yoshimoto, B. Iwamoto, K. Shimada, C.A. Ross, K. Sekiguchi, A.B. Granovsky, Y. Nakamura, H. Uchida, and M. Inoue (OpenAccess) Sci. Reports, vol.9, (2019) 16472-1 – 16472-11 (E-19-49) (https://www.nature.com/articles/s41598-019-52889-w)
R-19-36	“Understanding leakage currents through Al2O3 on SrTiO3” T. Goto, T. Yoshimoto, B. Iwamoto, K. Shimada, C.A. Ross, K. Sekiguchi, A.B. Granovsky, Y. Nakamura, H. Uchida, and M. Inoue Jour. Appl. Phys., vol.126, (2019) 185301-1 – 185301-7
R-19-37	“Visualizing metal/HfO2/SiO2/Si(001) interface electrostatic barrier heights with ballistic hole emission microscopy” J. Rogers, H. Choi, S. Gassner, W. Nolting, D. Pennock, S. Consiglio, and V.P. LaBella Jour. Appl. Phys., vol.126, (2019) 195302-1 – 195302-6

2018年

R-18-01	“Correlation between stoichiometry and properties of scandium oxide films prepared by reactive magnetron sputtering” A. Belosludtseva, K. Juškevičius, L. Ceizaris, R. Samuilovas, S Stanionytė, V. Jasulaitienė, and S. Kičas Appl. Surf. Sci., vol.427, (2018) 312 - 318 (M-18-04)
R-18-02	“Reconstruction-stabilized epitaxy of LaCoO3/SrTiO3(111) heterostructures by pulsed laser deposition” M. Hu, Q. Zhang, L. Gu, Q. Guo, Y. Cao, M. Kareev, J. Chakhalian, and J. Guo Appl. Phys. Lett., vol.112, (2018) 031603-1 - 031603-5 (E-18-09)
R-18-03	“Low-temperature formation of c-axis-oriented aluminum nitride thin films by plasma-assisted reactive pulsed-DC magnetron sputtering” K. Takenaka, Y. Satake, G. Uchida, and Y. Setsuhara Jpn. Jour. Appl. Phys., vol.57, (2018) 01AD06-1 - 01AD06-5
R-18-04	“Electron–hole pairs generated in ZrO2 nanoparticle resist upon exposure to extreme ultraviolet radiation” T. Kozawa, J.J. Santillan, and T. Itani Jpn. Jour. Appl. Phys., vol.57, (2018) 026501-1 - 026501-6
R-18-05	“Determination of specific ion positions of Cr3+ and O2- in Cr2O3 thin films and their relationship to exchange anisotropy at Co/Cr2O3 interfaces” Y. Shiratsuchi, Y. Nakano, N. Inami, T. Ueno, K. Ono, R. Kumai, R. Sagayama, and R. Nakatani Jour. Appl. Phys., vol.123, (2018) 103903-1 - 103903-7
R-18-06	“Tunable critical temperature for superconductivity in FeSe thin films by pulsed laser deposition” Z. Feng, J. Yuan, G. He, W. Hu, Z. Lin, D. Li, X. Jiang, Y. Huang, S. Ni, J. Li, B. Zhu, X. Dong, F. Zhou, H. Wang, Z. Zhao, and K. Jin (OpenAccess) Sci. Reports, vol.8, (2018) 4039-1 - 4039-6 (E-18-16) (http://www.nature.com/articles/s41598-018-22291-z)
R-18-07	“Effect of Nb concentration on the spin-orbit coupling strength in Nb-doped SrTiO3 epitaxial thin films” S.W. Cho, M. Lee, S. Woo, K. Yim, S. Han, W.S. Choi, and S. Lee (OpenAccess) Sci. Reports, vol.8, (2018) 5739-1 - 5739-8 (E-18-17) (http://www.nature.com/articles/s41598-018-23967-2)
R-18-8	“Thickness-Dependent Strain Evolution of Epitaxial SrTiO3 Thin Films Grown by Ion Beam Sputter Deposition” G. Panomsuwan and N. Saito Cryst. Res. Technol., vol.53, (2018) 1700211-1 – 1700211-7 (I-18-04, E-18-26)
R-18-9	“Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films” M. Mattinen, P.J. King, L. Khriachtchev, K. Meinander, J.T. Gibbon, V.R. Dhanak, J. Räisänen, M. Ritala, and M. Leskelä Small, vol.14, (2018) 1800547-1 – 1800547-8 (M-18-42, I-18-10)
R-18-10	“Surface and interface properties of polar thin films on a ferroelectric substrate: ZnO on LiNbO3 (0001) and (0001)” X. Zhu, and E.I. Altman Jour. Vac. Sci. Technol. -A, vol.36, (2018) 021511-1 – 021511-10 (E-18-35)
R-18-11	“Thermodynamic control of ferroelectric-phase formation in HfxZr1-xO2 and ZrO2” S. Shibayama, T. Nishimura, S. Migita, and A. Toriumi Jour. Appl. Phys., vol.124, (2018) 184101-1 – 184101-7 (M-18-43)
R-18-12	“Band alignment at β-(AlxGa1-x)2O3/β-Ga2O3 (100) interface fabricated by pulsed-laser deposition” R. Wakabayashi, M. Hattori, K. Yoshimatsu, K. Horiba, H. Kumigashira, and A. Ohtomo Appl. Phys. Lett., vol.112, (2018) 232103-1 – 232103-4 (E-18-36)
R-18-13	“Correlation between passivation film density and reliability of In–Ga–Zn–O thin-film transistors” S.G. Mehadi Aman and M. Furuta Jpn. Jour. Appl. Phys., vol.57, (2018) 088001-1 – 088001-2
R-18-14	“Dihydroxy-hexahelicene in Thin Films; Structural Characterization and Photoelectrochemical Properties” M.N. Kayes, M.J. Miah, M. Shahabuddin, M. Karikomi, S. Yoshihara, E. Nasuno, N. Kato, and K. Iimura Trans. Mat. Res. Soc. Japan, vol.43[2], (2018) 57 - 60
R-18-15	“Large exchange bias induced by polycrystalline Mn3Ga antiferromagnetic films with controlled layer thickness” H. Wu, I. Sudoh, R. Xu, W. Si, C.A.F Vaz, J. Kim, G. Vallejo-Fernandez, and A. Hirohata (OpenAccess) J. Phys. D: Appl. Phys., vol.51, (2018) 215003-1 – 215003-8 (M-18-44) (https://iopscience.iop.org/article/10.1088/1361-6463/aabd8e)
R-18-16	“Microstructure and magneto-optical surface plasmon resonance of Co/Au multilayers” C. Rizal, S. Pisana, I. Hrvoic, and E.E Fullerton (OpenAccess) J. Phys. Commun., vol.2, (2018) 055010-1 – 055010-9 (M-18-45) (https://iopscience.iop.org/article/10.1088/2399-6528/aac0e0)
R-18-17	“Self-organisation and characterisation of hierarchical structures in trimethyl b-cyclodextrin nano-films” S. Ogawa, K. Ashida, T. Kaneko, and I. Takahashi (OpenAccess) Mater. Chem Front., vol.2, (2018) 2191 – 2200 (M-18-46) (https://pubs.rsc.org/en/content/articlelanding/2018/QM/C8QM00299A#!divAbstract)
R-18-18	“Dielectric properties of amorphous Ta-Ge-O and Ta-Si-O thin films” T.A. Naoi, and R.B. van Dover Jour. Appl. Phys., vol.123, (2018) 244103-1 – 244103-6
R-18-19	“Bulk transport properties of bismuth selenide thin films grown by magnetron sputtering approaching the two-dimensional limit” Y.R. Sapkota, and D. Mazumdar Jour. Appl. Phys., vol.124, (2018) 105306-1 – 105306-7 (E-18-47)
R-18-20	“Grazing incident X-ray fluorescence combined with X-ray reflectometry metrology protocol of telluride-based films using in-lab and synchrotron instruments” W. Pessoa, A. Roule, E. Nolot, Y. Mazel, M. Bernard, M.-C. Lépy, Y. Ménesguen, A. Novikova, P. Gergaud, F. Brigidi, and D. Eichert Spectrochim. Acta -B, vol.149, (2018) 143 – 149
R-18-21	“Swelling kinetics and electrical charge transport in PEDOT:PSS thin films exposed to water vapor” B. Sarkar, M. Jaiswal, and D.K. Satapathy Jour. Phys.: Condens. Matter, vol.30, (2018) 225101-1 – 225101-9
R-18-22	“ゾルゲル法を用いた三酸化タングステタン薄膜の作製と評価” 小池一歩・村上聡・岩田知也・亀井龍真・矢野満明材料（Jour. Soc. Mater. Sci. Jpn.）, vol.67, (2018) 849 – 853 (M-18-48)
R-18-23	“Improving carrier mobility of polycrystalline Ge by Sn doping” K. Moto, R. Yoshimine, T. Suemasu, and K. Toko (OpenAccess) Sci. Reports, vol.8, (2018) 14832-1 – 14832-7 (https://www.nature.com/articles/s41598-018-33161-z)
R-18-24	“Non-uniform Excitation States in Photoinduced Deformation of Amorphous Carbon Nitride Films” M. Aono, T. Harata, N. Kitazawa, H. Abe, S. Ishii, Y. Sato, and M. Terauchi (OpenAccess) Sci. Reports, vol.8, (2018) 15066-1 – 15066-7 (https://www.nature.com/articles/s41598-018-33364-4)
R-18-25	“Challenges of fabrication of a large-area-uniform molybdenum disulfide layered thin film at low growth temperature by atmospheric-pressure solution-based mist CVD” S. Sato, N. Nitta, M. Sakamoto, L. Liu, P. Rutthongjan, M. Nishi, M. Ueda, T. Yasuoka, R. Hasegawa, Y. Tagashira, T. Ozaki, E.K.C. Pradeep, G.T. Dang, and T. Kawaharamura Jpn. Jour. Appl. Phys., vol.57, (2018) 110306-1 – 110306-4 (M-18-49)
R-18-26	“Measurements of the band alignment at coherent α-Ga2O3/Al2O3 heterojunctions” T. Oshima, Y. Kato, E. Kobayashi, and K. Takahashi Jpn. Jour. Appl. Phys., vol.57, (2018) 080308-1 – 080308-4 (E-18-37)
R-18-27	“Thickness dependence of ferrimagnetic compensation in amorphous rare-earth transition-metal thin films” C.T. Ma, B.J. Kirby, X. Li, and S.J. Poon Appl. Phys. Lett., vol.113, (2018) 172404-1 – 172404-5
R-18-28	“Structural characterization of tantalum nitride films as wet etch stop layer in advanced multiwork function metal gate MOSFETs” P. Mennell, H. Parvaneh, Z. Bayindir, D.H. Kang, F. Baumann, A. Madan, A. Bello, A. Shalini, and M. Klare Jour. Vac. Sci. Technol. –B, vol.36, (2018) 062904-1 – 062904-10
R-18-29	“Nanofocusing of X-ray free-electron laser using wavefront-corrected multilayer focusing mirrors” S. Matsuyama, T. Inoue, J. Yamada, J. Kim, H. Yumoto, Y. Inubushi, T. Osaka, I. Inoue, T. Koyama, K. Tono, H. Ohashi, M. Yabashi, T. Ishikawa, and K. Yamauchi (OpenAccess) Sci. Reports, vol.8, (2018) 17440-1 – 17440-10 (https://www.nature.com/articles/s41598-018-35611-0)
R-18-30	“Electrical andstructuralpropertiesofepitaxiallydepositedchromium thin films” M. Ohashi, M. Sawabu, H. Nakanishi, K. Ohashi, and K. Maeta Physica –B, vol.536, (2018) 790 – 792 (E-18-39)
R-18-31	“Emerging two-dimensional ferromagnetism in silicene materials” A.M. Tokmachev, D.V. Averyanov, O.E. Parfenov, A.N. Taldenkov, I.A. Karateev, I.S. Sokolov, O.A. Kondratev, and V.G. Storchak (OpenAccess) Natur. Commun., vol.9, (2018) 1672-1 – 1672-9 (M-18-64) (https://www.nature.com/articles/s41467-018-04012-2)
R-18-32	“Coupled Cu and Mn charge and orbital orders in YBa2Cu3O7/Nd0.65(Ca1-ySry)0.35MnO3 multilayers” E. Perret, C. Monney, S. Johnston, J. Khmaladze, F. Lyzwa, R. Gaina, M. Dantz, J. Pelliciari, C. Piamonteze, B.P.P. Mallett, M. Minola, B. Keimer, T. Schmitt, and C. Bernhard (OpenAccess) Commun. Phys., vol.1, (2018) 45-1 – 45-10 (M-18-86) (https://www.nature.com/articles/s42005-018-0046-z)
R-18-33	“Challenges of fabrication of a large-area-uniform molybdenum disulfide layered thin film at low growth temperature by atmospheric-pressure solution-based mist CVD” S. Sato, N. Nitta, M. Sakamoto, L. Liu, P. Rutthongjan, M. Nishi, M. Ueda, T. Yasuoka, R. Hasegawa, Y. Tagashira, T. Ozaki, E.K. C. Pradeep, G.T. Dang, and T. Kawaharamura Jpn. Jour. Appl. Phys., vol.57, (2018) 110306-1 – 110306-5 (M-18-100)

2017年

R-17-01	“Layer-by-layer epitaxial thin films of the pyrochlore Tb2Ti2O7” L. Bovo, C.M. Rouleau, D. Prabhakaran, and S.T. Bramwell (OpenAccess) Nanotechnology, vol.28, (2017) 055708-1 – 055708-8 (E-17-03) (http://iopscience.iop.org/article/10.1088/1361-6528/aa5112)
R-17-02	“Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications” C.V. Falub, H. Rohrmann, M. Bless, M. Meduňa, M. Marioni, D. Schneider, J.H. Richter, and M. Padrun (OpenAccess) AIP Advances, vol.7, (2017) 056414-1 – 056414-7 (https://aip.scitation.org/doi/10.1063/1.4973945)
R-17-03	“Flexible amorphous metal films with high stability” M. Liu, C.R. Cao, Y.M. Lu, W.H. Wang, and H.Y. Bai Appl. Phys. Lett., vol.110, (2017) 031901-1 – 031901-5
R-17-04	“Anomalous resistivity upturn in epitaxial L21-Co2MnAl films” L.J. Zhu and J.H. Zhao (OpenAccess) Sci. Reports, vol.7, (2017) 42931-1 – 42931-7 (E-17-07) (http://www.nature.com/articles/srep42931)
R-17-05	“Tunable optical properties in atomic layer deposition grown ZnO thin films” D. Pal, A. Mathur, and A. Singh, J. Singhal, A. Sengupta, S. Dutta, S. Zollner, S. Chattopadhyay Jour. Vac. Sci. Technol., -A, vol.35, (2017) 01B108-1 – 01B108-9 (M-17-07)
R-17-06	“YCo5±x thin films with perpendicular anisotropy grown by molecular beam epitaxy” S. Sharma, E. Hildebrandt, S.U. Sharath, I. Radulov, and L. Alff Jour. Magn. Magn. Mater., vol.432, (2017) 382 – 386 (I-17-01, E-17-09)
R-17-07	“Probing the spiral magnetic phase in 6nm textured erbium using polarised neutron reflectometry” N. Satchell, J.D.S Witt, G. Burnell, P.J. Curran, C.J. Kinane, T.R. Charlton, S. Langridge, and J.F.K. Cooper Jour. Phys.: Condens. Matter., vol.29, (2017) 0558018-1 – 055801-5 (M-17-26)
R-17-08	“Plasma-assisted atomic layer epitaxial growth of aluminum nitride studied with real time grazing angle small angle x-ray scattering” V.R. Anderson, N. Nepal, S.D. Johnson, Z.R. Robinson, A. Nath, A.C. Kozen, S.B. Qadri, A. DeMasi, J.K. Hite, K.F. Ludwig, Jr., and C.R. Eddy, Jr. Jour. Vac. Sci. Technol., -A, vol.35, (2017) 031508-1 – 031508-7 (M-17-32)
R-17-09	“Quantitative and simultaneous analysis of the polarity of polycrystalline ZnO seed layers and related nanowires grown by wet chemical deposition” S. Guillemin, R. Parize, J. Carabetta, V. Cantelli, D. Albertini, B. Gautier, G. Brémond, D.D Fong, H. Renevier, and V. Consonni Nanotechnology, vol.28, (2017) 095704-1 – 095704-10
R-17-10	“Effect of lattice strain on cobalt ferrite Co0.75Fe2.25O4(111) thin films” R. Patel, T. Tainosho, Y. Hisamatsu, S. Sharmin, E. Kita, and H. Yanagihara Jpn. Jour. Appl. Phys., vol.56, (2017) 053001-1 – 053001-5 (I-17-05, E-17-24)
R-17-11	“Magnetization dynamics and damping behavior of Co/Ni multilayers with a graded Ta capping layer” M. Jaris, D. Lau, V. Sokalski, and H. Schmidt Jour. Appl. Phys., vol.121, (2017) 163903-1 – 163903-4
R-17-12	“Optical evidence for blue shift in topological insulator bismuth selenide in the few-layer limit” Y.R. Sapkota, A. Alkabsh, A. Walber, H. Samassekou, and D. Mazumdar Appl. Phys. Lett., vol.110, (2017) 181901-1 – 181901-4 (M-17-43)
R-17-13	“The asymmetric band structure and electrical behavior of the GdScO3/GaN system” S. Iacopetti, P. Shekhter, R. Winter, T.C.U. Tromm, J. Schubert, and M. Eizenberg Jour. Appl. Phys., vol.121, (2017) 205303-1 – 205303-5 (E-17-28)
R-17-14	“Annealing Induced Morphological Modifications In PTFE Films Deposited By Magnetron Sputtering” S. Tripathi, Rajnarayan De, K. Divakar Rao, S. Maidul Haque, J. S. Misal, C. Prathap, S. C. Das, V. Ganesan, and N. K. Sahoo AIP Conf. Proc., vol.1832, (2017) 080044-1 – 080044-3
R-17-15	“Chemically Stable Atomic-Layer-Deposited Al2O3 Films for Processability” M. Broas, O. Kanninen, V. Vuorinen, M. Tilli, and M. Paulasto-Kröckel (OpenAccess) ACS Omega, vol.2, (2017) 3390 – 3398 (M-17-57) (https://pubs.acs.org/doi/10.1021/acsomega.7b00443)
R-17-16	“Thickness and structure of thin films determined by background analysis in hard X-ray photoelectron spectroscopy” Y.-T. Cui, S. Tougaard, H. Oji, J.-Y. Son, Y. Sakamoto, T. Matsumoto, A. Yang, O. Sakata, H. Song, and I. Hirosawa Jour. Appl. Phys., vol.121, (2017) 225307-1 – 225307-10
R-17-17	“Excluded volume effects caused by high concentration addition of acid generators in chemically amplified resists used for extreme ultraviolet lithography” T. Kozawa, K. Watanabe, K. Matsuoka, H. Yamamoto, Y. Komuro, D. Kawana, and A. Yamazaki Jpn. Jour. Appl. Phys., vol.56, (2017) 086502-1 – 086502-5
R-17-18	“Glass Transition of Ultrathin Sugar Films Probed by X-Ray Reflectivity” S. Ogawa and I. Takahashi (OpenAccess) Chapter 6, p.115-130 in “Carbohydrate”, Dr. Mahmut Caliskan, I. Halil Kavakli and Gul Cevahir Oz (Eds.), published by InTech (2017) (M-17-63) (https://www.intechopen.com/books/carbohydrate/glass-transition-of-ultrathin-sugar-films-probed-byx-ray-reflectivity)
R-17-19	“RRAM Memories with ALD High-K Dielectrics: Electrical Characterization and Analytical Modeling” H. Castán, S. Dueñas, A. Sardiña, H. García, T. Arroval, A. Tamm, T. Jõgiaas, K. Kukli, and J. Aarik (OpenAccess) Chapter 9, p.165-178 in “Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets”, Dr. Jagannathan Thirumalai (Ed.), published by InTech (2017) (M-17-64) (https://www.intechopen.com/books/thin-film-processes-artifacts-on-surface-phenomena-and-technological-facets/rram-memories-with-ald-high-k-dielectrics-electrical-characterization-and-analytical-modeling)
R-17-20	“Enhanced resistive memory in Nb-doped BaTiO3 ferroelectric diodes” Q. Jin, C. Zheng, Y. Zhang, C. Lu, J. Dai, and Z. Wen Appl. Phys. Lett., vol.111, (2017) 032902-1 – 032902-5 (M-17-37)
R-17-21	“Application-Specific Catalyst Layers: Pt-Containing Carbon Nanofibers for Hydrogen Peroxide Detection” T. Laurila, S. Sainio, H. Jiang, N. Isoaho, J.E. Koehne, J. Etula, J. Koskinen, and M. Meyyappan (OpenAccess) ACS Omega, vol.2, (2017) 496 – 507 (M-17-74) (https://pubs.acs.org/doi/10.1021/acsomega.6b00441)
R-17-22	“Multiple Roles of Hydrogen Treatments in Amorphous In–Ga–Zn–O Films” H. Tang, Y. Kishida, K. Ide, Y. Toda, H. Hiramatsu, S. Matsuishi, S. Ueda, N. Ohashi, H. Kumomi, H. Hosono, and T. Kamiya ECS Jour. Solid State Sci. Technol., vol.6, (2017) P365 – P372
R-17-23	“The electrical resistivity of epitaxially deposited chromium films” M. Sawabu, M. Ohashi, K. Ohashi, M. Miyagawa, T. Kubota, and K. Takanashi (OpenAccess) J. Phys.: Conf. Ser., vol.871, (2017) 012002-1 – 012002-6 (http://iopscience.iop.org/article/10.1088/1742-6596/871/1/012002)
R-17-24	“Interface-induced spontaneous positive and conventional negative exchange bias effects in bilayer La0.7Sr0.3MnO3/Eu0.45Sr0.55MnO3 heterostructures” J. Krishna Murthy and P. S. Anil Kumar (OpenAccess) Sci. Reports, vol.7, (2017) 6919-1 – 6919-11 (E-17-42) (http://www.nature.com/articles/s41598-017-07033-x)
R-17-25	“Magnetic and structural properties of antiferromagnetic Mn2VSi alloy films grown at elevated temperatures” H. Wu, G. Vallejo-Fernandez, and A. Hirohata (OpenAccess) J. Phys. D: Appl. Phys. vol.50, (2017) 375001-1 – 375001-4 (M-17-76) (http://iopscience.iop.org/article/10.1088/1361-6463/aa80d5)
R-17-26	“Kinetic pathway of the ferroelectric phase formation in doped HfO2 films” L. Xu, T. Nishimura, S. Shibayama, T. Yajima, S. Migita, and A. Toriumi Jour. Appl. Phys. vol.122, (2017) 124104-1 –124104-7 (M-17-82)
R-17-27	“Bias sputtered NbN and superconducting nanowire devices” A.E. Dane, A.N. McCaughan, D. Zhu, Q. Zhao, C.-S. Kim, N. Calandri, A. Agarwal, F. Bellei, and K.K. Berggren Appl. Phys. Lett., vol.111, (2017) 122601-1 –122601-5
R-17-28	“Temperature dependent optical characterization of Ni-TiO2 thin films as potential photocatalytic material” R. De, S. Maidul Haque, S. Tripathi, K. Divakar Rao, R. Singh, T. Som, and N.K. Sahoo (OpenAccess) AIP Advances, vol.7, (2017) 095115-1 – 095115-12 (M-17-83) (https://aip.scitation.org/doi/10.1063/1.4998769)
R-17-29	“Preparation of epitaxial yttrium–iron garnet micropatterns using metal–organic decomposition with electron-beam irradiation” K. Kasahara and T. Manago Jpn. Jour. Appl. Phys., vol.56, (2017) 110303-1 – 110303-4 (I-17-12, E-17-53)
R-17-30	“Optical properties of cubic and monoclinic Y2O3 films prepared through radio frequency magnetron sputtering” C. Hua, C. Li, J. Guo, X. Yan, J. Liu, L. Chen, J. Wei, and L. Hei Surf. Coat. Tehnol., vol.320, (2017) 279 – 283
R-17-31	“Electric-field control of tri-state phase transformation with a selective dual-ion switch” N. Lu, P. Zhang, Q. Zhang, R. Qiao, Q. He, H.-B. Li, Y. Wang, J. Guo, D. Zhang, Z. Duan, Z. Li, M. Wang, S. Yang, M. Yan, E. Arenholz, S. Zhou, W. Yang, L. Gu, C.-W. Nan, J. Wu, Y. Tokura, and P. Yu Nature, vol.546, (2017) 124 – 128 (E-17-64)
R-17-32	“Stress-free deposition of [001] preferentially oriented titanium thin film by Kaufman ion-beam source” I. Gablech, O. Caha, V. Svatoš, J. Pekárek, P. Neužil, and T. Šikola Thin Solid Films, vol.638, (2017) 57 – 62 (I-17-19)
R-17-33	“Structure and morphology of magnetron sputter deposited ultrathin ZnO films on confined polymeric template” A. Singh, S. Schipmann, A. Mathur, D. Pal, A. Sengupta, U. Klemradt, and S. Chattopadhyay Appl. Surf. Sci., vol.414, (2017) 114 – 123
R-17-34	“The microstructure of Si surface layers after plasmaimmersion He+ ion implantation and subsequent thermal annealing” A. Lomov, K. Shcherbachev, Y. Chesnokov and D. Kiselev Jour. Appl. Cryst., vol.50, (2017) 539 – 546 (E-17-80)
R-17-35	“Fast in situ X-ray analysis of Ni silicide formation” P. Zaumseil and D. Wolansky Phys. Stat. Sol. –(b), vol.254, (2017) 1600859-1 – 1600859-5 (M-17-97)
R-17-36	“Antibacterial activity of the thin ZnO film formed by atomic layer deposition under UV-A light” K.-H. Park, G.D. Han, K.C. Neoh, T.-S. Kim, J.H. Shim, and H.-D. Par Chem. Eng. Jour., vol.328, (2017) 988 – 966 (M-17-98)
R-17-37	“Enhanced tunability of electrical and magnetic properties in (La,Sr)MnO3 thin films via field-assisted oxygen vacancy modulation” H.F. Wong, S.M. Ng, W.F. Cheng, Y. Liu, X. Chen, D. von Nordheim, C.L. Mak, J. Dai, B. Ploss, C.W. Leung Solid-State Electronics, vol.138, (2017) 56 – 61 (E-17-81)
R-17-38	“Magnetic and Electrical Performance of Atomic Layer Deposited Iron Erbium Oxide Thin Films” A. Tamm, K. Kalam, H. Seemen, J. Kozlova, K. Kukli, J. Aarik, J. Link, R. Stern, S. Dueñas, and H. Castán (OpenAccess) ACS Omega, vol.2, (2017) 8836 – 8842 (M-17-99) (https://pubs.acs.org/doi/10.1021/acsomega.7b01394)
R-17-39	“Effect of substrates and thickness on optical properties in atomic layer deposition grown ZnO thin films” D. Pal, J. Singhal, A. Mathur, A. Singh, S. Dutta, S. Zollner, and S. Chattopadhyay Appl. Sur. Sci., vol.421, (2017) 341 – 348 (M-17-104)
R-17-40	“Structural, magnetic and electronic properties of pulsed-laser-deposition grown SrFeO3−d thin films and SrFeO3−d/La2/3Ca1/3MnO3 multilayers” E. Perret, K. Sen, J. Khmaladze, B.P.P. Mallett, M. Yazdi-Rizi, P. Marsik, S. Das, I. Marozau, M.A. Uribe-Laverde, R. de Andrés Prada, J. Strempfer, M. Döbeli, N. Biškup, M. Varela, Y.-L. Mathis, and C. Bernhard J. Phys.: Condens. Matter, vol.29, (2017) 495601-1 – 495601-15 (E-17-86)
R-17-41	“High-hole mobility polycrystalline Ge on an insulator formed by controlling precursor atomic density for solid-phase crystallization” K. Toko, R. Yoshimine, K. Moto, and T. Suemasu (OpenAccess) Sci Reports, vol.7, (2017) 16981-1 – 16981-7 (http://www.nature.com/articles/s41598-017-17273-6)
R-17-42	“Perpendicular magnetic anisotropy and microstructure properties of nanoscale Co/Au multilayers” C. Rizal and E.E. Fullerton J. Phys. D: Appl. Phys., vol.50, (2017) 355002-1 – 355002-11 (M-17-140)

2016年

R-16-01	“Atomic layer deposition of NiS and its application as cathode material in dye sensitized solar cell” N. Mahuli and S.K. Sarkar J. Vac. Sci. Technol. A, vol.34, (2016) 01A142-1 – 01A142-8 (M-16-06)
R-16-02	“Low temperature platinum atomic layer deposition on nylon-6 for highly conductive and catalytic fiber mats” J.Z. Mundy, A. Shafiefarhood, F. Li, S.A. Khan, and G.N. Parsons J. Vac. Sci. Technol. A, vol.34, (2016) 01A152-1 – 01A152-6 (M-16-07)
R-16-03	“Optical properties of single crystalline SrMoO3 thin films” A. Radetinac, J. Zimmermann, K. Hoyer, H. Zhang, P. Komissinskiy, and L. Alff Jour. Appl. Phys., vol.119, (2016) 055302-1 – 055302-4 (E-16-04)
R-16-04	“Suppression of Structural Phase Transition in VO2 by Epitaxial Strain in Vicinity of Metal-insulator Transition” M. Yang, Y. Yang, B. Hong, L. Wang, K. Hu, Y. Dong, H. Xu, H. Huang, J. Zhao, H. Chen, L. Song,H. Ju, J. Zhu, J. Bao, X. Li, Y. Gu, T. Yang, X. Gao, Z. Luo, and C. Gao (OpenAccess) Sci. Reports., vol.6, (2016) 23119-1 –23119-10 (E-16-09)
R-16-05	“Nanostructured carbon-based membranes: nitrogen doping effects on reverse osmosis performance” J. Ortiz-Medina, H. Kitano, A. Morelos-Gomez, Z. Wang, T. Araki, C.S. Kang, T. Hayashi, K.Takeuchi, T. Kawaguchi, A. Tanioka, R. Cruz-Silva1, M. Terrones and M. Endo (OpenAccess) NPG Asia Mater., vol.8, (2016) e258-1 – e258-10
R-16-06	“Ta2O5-based redox memory formed by neutral beam oxidation” T. Ohno and S. Samukawa Jpn. Jour. Appl. Phys., vol.55, (2016) 06GJ01-1 – 06GJ01-3
R-16-07	“Growth temperature-dependent metal–insulator transition of vanadium dioxide epitaxial films on perovskite strontium titanate (111) single crystals” L. Wang, Y. Yang, J. Zhao, B. Hong, K. Hu, J. Peng, H. Zhang, X. Wen, Z. Luo, X. Li, and C. Gao Jour. Appl. Phys., vol.119, (2016) 145301-1 – 145301-8 (E-16-13)
R-16-08	“Oxygen partial pressure dependent optical properties of glancing angle deposited (GLAD) Ta2O5 films deposited by magnetron sputtering” S. Tripathi, S. Maidul Haque, K. Divakar Rao, J.S. Misal, C. Pratap and N.K. Sahoo (OpenAccess) AIP Conf. Proc., vol.1731, (2016) 088076-1 – 088076-3
R-16-09	“Effect of sputtering power on MgF2 thin films deposited by sputtering technique under fluorine trapping” R. De, S. Maidul Haque, S. Tripathi, C. Prathap, K. Divakar Rao, and N.K. Sahoo (OpenAccess) AIP Conf. Proc., vol.1731, (2016) 088078-1 – 088078-3 (M-16-32)
R-16-10	“Structural coupling across the direct EuO/Si interface” D.V. Averyanov, A.M. Tokmachev, I.A. Likhachev, E.F. Lobanovich, O.E. Parfenov, E.M Pashaev, Y.G. Sadofyev, I.A. Subbotin, S.N .Yakunin, and V.G. Storchak Nanotechnology, vol.27, (2016) 045703-1 – 0045703-7 (E-16-19)
R-16-11	“Metal−Organic Coordination Network Thin Film by Surface-Induced Assembly” S. Laokroekkiat, M. Hara, S. Nagano, and Y. Nagao Langmuir, vol.32, (2016) 6648 – 6655
R-16-12	“Fabrication and Characterization of Molecular Films of 11-Oxa[9]helicene and 9-Diethyleneglycoxy-11-Oxa[9]helicene” M.J. Miah, M. Shahabuddin, M.N. Kayes, M. Karikomi, E. Nasuno, N. Kato, and K. Iimura Trans. Mat. Res. Soc. Jpn., vol.41, (2016) 151 – 154
R-16-13	“Roles of Energy/Charge Cascades and Intermixed Layers at Donor/Acceptor Interfaces in Organic Solar Cells” K. Nakano, K. Suzuki, Y. Chen, and K. Tajima (OpenAccess) Sci. Reports, vol.6, (2016) 29529-1 – 29529-11
R-16-14	“Atomic layer deposited cobalt oxide: An efficient catalyst for NaBH4 hydrolysis” D.K. Nandi, J. Manna, A. Dhara, P. Sharma, and S.K. Sarkar Jour. Vac. Sci. Technol.-A, vol.34, (2016) 01A115-1 – 01A115-8 (M-16-44)
R-16-15	“Giant photocurrent enhancement by transition metal doping in quantum dot sensitized solar cells” G. Rimal, Ar.K. Pimachev, A.J. Yost, U. Poudyal, S. Maloney, W. Wang, T.Y. Chien, Y. Dahnovsky, and J. Tang Appl. Phys. Lett., vol.109, (2016) 103901-1 – 103901-5 (M-16-62)
R-16-16	“Spin–orbit torque-assisted switching in magnetic insulator thin films with perpendicular magnetic anisotropy” P. Li, T. Liu, H. Chang, A. Kalitsov, W. Zhang, G. Csaba, W. Li, D. Richardson, A. DeMann, G. Rimal, H. Dey, J.S. Jiang, W. Porod, S.B. Field, J. Tang, M.C. Marconi, A. Hoffmann, O. Mryasov, and M. Wu (OpenAccess) Nature Commun., vol.10, (2016) 34609-1 – 34609-7 (M-16-73)
R-16-17	“In-situ growth of superconducting SmO1−xFxFeAs thin films by pulsed laser deposition” S. Haindl, K. Hanzawa, H. Sato, H. Hiramatsu, and H. Hosono (OpenAccess) Sci. Reports, vol.6, (2016) 35797-1 – 35797-6 (E-16-40)
R-16-18	“Impact of oxygen stoichiometry on electroforming and multiple switching modes in TiN/TaOx/Pt based ReRAM” S.U. Sharath, M.J. Joseph, S. Vogel, E. Hildebrandt, P. Komissinskiy, J. Kurian, T. Schroeder, and L. Alff Appl. Phys. Lett., vol.109, (2016) 173503-1 – 173503-5
R-16-19	“Solution-Processed All-Oxide Transparent High-Performance Transistors Fabricated by Spray-Combustion Synthesis” B. Wang, X. Yu, P. Guo, W. Huang, L. Zeng, N. Zhou, L. Chi, M.J. Bedzyk, R.P.H. Chang, T.J. Marks, and A. Facchetti Adv. Electron. Mater., vol.2, (2016) 1500421-1 – 1500421-9 (M-16-91)
R-16-20	“Room Temperature Phase Transition in Methylammonium Lead Iodide Perovskite Thin Films Induced by Hydrohalic Acid Additives” C.M.M. Soe, C.C. Stoumpos, B. Harutyunyan, E.F. Manley, L.X. Chen, M.J. Bedzyk, T.J. Marks, and M.G. Kanatzidis Chem. Sus. Chem., vol.9, (2016) 2656 – 2665
R-16-21	“Anomalous elongation of c-axis of AlN on Al2O3 grown by MBE using NH3-cluster ions” Y. Ichinohe, K. Imai, K. Suzuki, and H. Saito Jour. Cryst. Growth, vol.454, (2016) 111 – 113 (I-16-16, E-16-57)
R-16-22	“Al2O3 thin films deposited by thermal atomic layer deposition: Characterization for photovoltaic applications” C Barbos, D. Blanc-Pelissier, A. Fave, C. Botell, P. Regreny, G. Grenet, E. Blanquet, A. Crisci, and M. Lemiti Thin Solid Films, vol.617, (2016) 101 – 113
R-16-23	“Annealing effects on the structural and electrical properties of sputtered tungsten thin films” A. Kaidatzis, V. Psycharis, K. Mergia, and D. Niarchosa Thin Solid Films, vol.619, (2016) 61 – 67 (M-16-93)
R-16-24	“Metal Oxide Transistors via Polyethylenimine Doping of the Channel Layer: Interplay of Doping, Microstructure, and Charge Transport” W. Huang, L. Zeng, X. Yu, P. Guo, B. Wang, Q. Ma, R.P.H. Chang, J. Yu, M.J. Bedzyk, T. Marks, and A. Facchetti Adv. Funct. Mater., vol.26, (2016) 6179 – 6187 (M-16-114)

2015年

R-15-01	“Epi-cleaning of Ge/GeSn heterostructures” L. Di Gaspare, D. Sabbagh, M. De Seta, A. Sodo, S. Wirths, D. Buca, P. Zaumseil, T. Schroeder, and G. Capellini Jour. Appl. Phys., vol.107, (2015) 44-49 (E-15-01)
R-15-02	“Atomic layer deposition of aluminum sulfide thin films using trimethylaluminum and hydrogen sulfide” S. Sinha, N. Mahuli, and S.K. Sarkar Jour. Vac. Sci. Technol. -A., vol.33, (2015) 01A139-1 – 01A 139-7
R-15-03	“Atomic layer deposition of titanium sulfide and its application in extremely thin absorber solar cells” N. Mahuli, and S.K. Sarkar Jour. Vac. Sci. Technol. -A., vol.33, (2015) 01A150-1 – 01A 150-5
R-15-04	“Monitoring the thin film formation during sputter deposition of vanadium carbide” M. Kaufholz, B. Krause S. Kotapati, M. Köhl, M.F. Mantilla, M. Stüber, S. Ulrich, R. Schneider, D.Gerthsend and T. Baumbach Jour. Synchrotorn Rad., vol.22, (2015) 76-85
R-15-05	“Modeling and simulation of acid generation in anion-bound chemically amplified resists used for extreme ultraviolet lithography” Y. Komuro, D. Kawana, T. Hirayama, K. Ohomori, and T. Kozawa Jpn. Jour. Appl. Phys., vol.54, (2015) 036506-1 – 036506-7
R-15-06	“Resistance switching of epitaxial VO2/Al2O3 heterostructure at room temperature induced by organic liquids” M. Yang, Y. Yang, B. Hong, H. Huang, S. Hu, Y. Dong, H. Wang, H. He, J. Zhao, X. Liu, Z.Luo, X. Li, H. Zhang, and C. Gao (OpenAccess) AIP Advances, vol.5, (2015) 037114-1 – 037114-6 (E-15-03)
R-15-07	“Epitaxial growth of tin(II) niobate with a pyrochlore structure” S. Katayama, Y. Ogawa, H. Hayashi, F. Oba, and I. Tanaka Jour. Cryst. Growth, vol.416, (2015) 126-129 (E-15-17)
R-15-08	“X-ray photoelectron spectroscopy and diffraction investigation of a metal–oxide-semiconductor heterostructure: Pt/Gd2O3/Si(111)” D. Ferrah, M. El Kazzi, G. Niu, C. Botella, J. Penuelas, Y. Robach, L. Louahadj, R. Bachelet, L.Largeau, G. Saint-Girons, Q. Liu, B. Vilquin, and G. Grenet Jour. Cryst. Growth, vol.416, (2015) 118-125 (E-15-18)
R-15-09	“Synthesis, Structure, and Spectroscopy of Epitaxial EuFeO3 Thin Films” A.K. Choquette, R. Colby, E.J. Moon, C.M. Schlepütz, M.D. Scafetta, D.J. Keavney, and S.J. May Cryst. Growth Design, vol.15, (2015) 1105-1111 (E-15-21)
R-15-10	“Epitaxial niobium dioxide thin films by reactive-biased target ion beam deposition” Y. Wang, R.B. Comes, S. Kittiwatanakul, S.A. Wolf, and J. Lu J. Vac. Sic. Tech. -A, vol.33, (2015) 021516-1 - 021516-5 (E-15-22)
R-15-11	“Structural Analyses of Thin SiO2 Films Formed by Thermal Oxidation of Atomically Flat Si Surface by Using Synchrotron Radiation X-Ray Characterization” K. Nagata, A. Ogura, I. Hirosawa, T. Suwa, A. Teramoto, T. Hattori, and T. Ohmi (OpenAccess) ECS Jour. Solid State Sci. Technol., vol.4, (2015) N96 – N98
R-15-12	“Effects of cation stoichiometry on electronic and structural properties of LaNiO3” C.R. Smith, A.C. Lang, V. Shutthanandan, M.L. Taheri, and S.J. May J. Vac. Sic. Tech. -A, vol.33, (2015) 041510-1 - 041510-5 (E-15-27)
R-15-13	“Fabrication and opto-electrical properties of amorphous (Zn,B)O thin film by pulsed laser deposition” H.C. Tang, J Kim, H. Hiramatsu, H. Hosono, and T. Kamiya Jour. Ceram. Soc. Jpn., vol.123, (2015) 523-526
R-15-14	“Current-perpendicular-to-the-plane giant magnetoresistance in spin-valves with AgSn alloy spacers” J.C. Read, T.M. Nakatani, N. Smith, Y.-S. Choi, B.R. York, E. Brinkman, and J.R. Childress Jour. Appl. Phys., vol.118, (2015) 043907-1－043907-9
R-15-15	“Observation of quantum oscillation of work function in ultrathin-metal/semiconductor junctions” K. Takhar, M. Meer, D. Khachariya, S. Ganguly, and D. Saha Jour. Vac. Sci. Technol.-A, vol.33, (2015) 05E126-1 – 05E126-4
R-15-16	“Metal-Free Tetrathienoacene Sensitizers for High-Performance Dye-Sensitized Solar Cells” N. Zhou, K. Prabakaran, B. Lee, S.H. Chang, B. Harutyunyan, P. Guo, M.R. Butler, A. Timalsina, M.J.Bedzyk, M.A. Ratner, S. Vegiraju, S. Yau, C.G. Wu, R.P.H. Chang, A. Facchetti, M.C. Chen, and T. J.Marks Jour. Amer. Chem. Soc., vol.137, (2015) 4414-4423
R-15-17	“Electronic transport of titanate heterostructures and their potential as channels on (001) Si” L. Kornblum, E.N. Jin, O. Shoron, M. Boucherit, S. Rajan, C.H. Ahn, and F.J. Walker Jour. Appl. Phys., vol.118, (2015) 105301-1 – 105301-6 (E-15-34)
R-15-18	“Comparison of Spin and Blade coating Methods in Solution-process for Organic Light-emitting Devices” C.H. Jun, S. Ohisa, Y.J. Pu, T. Chiba, and J. Kido Jour. Photopolym. Sci. Technol., vol.28, (2015) 343-347 (I-15-07)
R-15-19	“Electronic transition above room temperature in CaMn7O12 films” A. Huon, A.C. Lang, D. Saldana-Greco, J.S. Lim, E.J. Moon, A.M. Rappe, M.L. Taheri, and S.J. May Appl. Phys. Lett., vol.107, (2015) 142901-1 – 142901-5 (E-15-36)
R-15-20	“Heteroepitaxial growth of SnSe films by pulsed laser deposition using Se-rich targets” T. Inoue, H. Hiramatsu, H. Hosono, and T. Kamiya Jour. Appl. Phys., vol.118, (2015) 205302-1 – 205301-14 (I-15-08, E-15-37)
R-15-21	“Persistent monolayer-scale chemical ordering in Si1−xGex heteroepitaxial films during surface roughening and strain relaxation” J.M. Amatya and J.A. Floro Jour. Appl. Phys., vol.118, (2015) 245302-1 – 245302-8 (E-15-55)
R-15-22	“Crystallization-Induced Energy Level Change of [6,6]-Phenyl-C61-Butyric Acid Methyl Ester (PCBM) Film: Impact of Electronic Polarization Energy” Y. Zhong, S. Izawa, K. Hashimoto, K. Tajima, T. Koganezawa, and H. Yoshida Jour. Phys. Chem. -C, vol.119, (2015) 23 – 28 (I-15-14)
R-15-23	“Raman scattering in La1−xSrxFeO3−δ thin films: annealing-induced reduction and phase transformation” M.A. Islam, Y. Xie, M.D. Scafetta, S.J. May and J.E. Spanier Jour. Phys.: Condens.Matter., vol.27, (2015) 155401-1 – 155401-7
R-15-24	“Effect of epitaxial strain on tunneling electroresistance in ferroelectric tunnel junctions” A. Sokolov, O. Bak, H. Lu, S. Li, E.Y. Tsymbal, and A. Gruverman Nanotechnology, vol.26, (2015) 305202-1 – 305202-7 (E-15-61)
R-15-25	“Increased magnetic moment induced by lattice expansion from a-Fe to a’-Fe8N” I. Dirba, P. Komissinskiy, O. Gutfleisch, and L. Alff Jour. Appl. Phys., vol.117, (2015) 173911-1 – 173911-5 (E-15-62)
R-15-26	“Atomic layer deposition of rutile and TiO2-II from TiCl4 and O3 on sapphire: Influence of substrate orientation on thin film structure” K. Möldre, L. Aarik, H. Mändar, A. Niilisk, R. Rammula, A. Tarre, and J. Aarik Jour. Cryst. Growth, vol.428, (2015) 86 – 92 (E-15-63)
R-15-27	“Molecular layer deposition of alucone films using trimethylaluminum and hydroquinone” D. Choudhury and S.K. Sarkar, and N. Mahuli Jour. Vac. Sci. Technol. -A, vol.3, (2015) 01A115-1 – 01A115-7

2014年

R-14-01	“A Facile Route for Producing Single-Crystalline Epitaxial Perovskite Oxide Thin Films” A.R. Akbashev, G. Chen, and J.E. Spanier NANO Lett., vol.14 (2014) 44-49 (E-14-03)
R-14-02	“Phase transition in ferroelectric Pb(Zr0.52Ti0.48)O3 epitaxial thin films” Q. Liu, O. marconot, M. Piquemal, C. Eypert, A.S. Borowiak, N. Baboux, B. Gautier, A. Benamrouche, P. Rojo-Romeo, Y. Robach, J. Penuelas, and B. Vilquin Thin Solid Films, vol.553, (2014) 85-88 (I-14-05, E-14-10)
R-14-03	“Atomic layer deposition of MgO films on yttria-stabilized zirconia microtubes” M. Part , A. Tamm, J. Kozlova, H. Mändar, T. Tätte, and K. Kukli Thin Solid Films, vol.553, (2014) 30-32 (M-14-10,)
R-14-04	“Silicon nitride thin films deposited using electron-beam evaporation in an RF plasma MBE system” D.S. Katzer, D.J. Meyer, D.F. Storm, N. Nepal, and V.D. Wheeler Jour. Vac. Sci. Technol. -B, vol.32, (2014) 02C117-1 – 02C117-5
R-14-05	“Tailoring the index of refraction of nanocrystalline hafnium oxide thin films” M. Vargas, N.R. Murphy, and C.V. Ramana Appl. Phys. Lett., vol.104, (2014) 101907-1 – 101907-5
R-14-06	“Substrate-dependent post-annealing effects on the strain state and electrical transport of epitaxial La5/8-yPryCa3/8MnO3 films” S. Hu, H. Huang, Y. Yang, Z. Luo, M. Yang, H. Wang, Y. Dong, B. Hong, H. He, J. Bao, and C. Gao (OpenAccess) AIP Advances, vol.4, (2014) 067109-1 – 067109-6 (E-14-22)
R-14-07	“Electronic transport and conduction mechanism transition in La1/3Sr2/3FeO3 thin films” R.C. Devlin, A.L. Krick, R.J. Sichel-Tissot, Y.J. Xie, and S.J. May Jour. Appl. Phys., vol.115, (2014) 233704-1 – 233704-8 (E-14-23)
R-14-08	“Indium tin oxide/InGaZnO bilayer stacks for enhanced mobility and optical stability in amorphous oxide thin film transistors” Y.J. Chung, U.K. Kim, E.S. Hwang, and C.S. Hwang Appl. Phys. Lett., vol.105, (2014) 013508-1 – 013508-5
R-14-09	“Ultrafast transient reflectance of epitaxial semiconducting perovskite thin films” S.Y. Smolin, M.D. Scafetta, G.W. Guglietta, J.B. Baxter, and S.J. May Appl. Phys Lett., vol.105, (2014) 022103-1 – 022103-5 (E-14-28)
R-14-10	“Structural study and ferroelectricity of epitaxial BaTiO3 films on silicon grown by molecular beam epitaxy” L. Mazet, R. Bachelet, L. Louahadj, D. Albertini, B. Gautier, R. Cours, S. Schamm-Chardon, G. Saint-Girons, and C. Dubourdieu Jour. Appl. Phys., vol.116, (2014) 214102-1 – 214102-9 (E-14-46)
R-14-11	“Two-Dimensional Mott Insulators in SrVO3 Ultrathin Films” M. Gu, S.A. Wolf, and J. Lu Adv. Mat. Interfaces, vol.1, (2014) 1300126-1 – 1300126-6 (E-14-51)
R-14-12	“Study of the Structural Quality of Heteroepitaxial Silicon-on-Sapphire Structures by High-Resolution X-Ray Diffraction, X-Ray Reflectivity, and Electron Microscopy” A.E. Blagov, A.L. Vasiliev, A.S. Golubeva, I.A. Ivanov, O.A. Kondratev, Yu.V. Pisarevsky, M. Yu. Presnyakov, P.A. Prosekov, and A.Yu. Seregin Crystallography Reports, vol.59, (2014) 315 – 322 (E-14-52)
R-14-13	“High performance silicon-based anodes in solid-state lithium batteries” R.B. Cervera, N. Suzuki, T. Ohnishi, M. Osada, K. Mitsuishi, T. Kambara and K. Takada Energy Environ. Sci., vol.7, (2014) 662 – 666
R-14-14	“Crystal orientation of epitaxial LiCoO2 films grown on SrTiO3 substrates” K. Nishio, T. Ohnishi, K. Akatsuka, and K. Takada J. Power Sources, vol.247, (2014) 687 – 691 (I-14-14, E-14-57)
R-14-15	“Control of Functional Responses Via Reversible Oxygen Loss in La1- xSrxFeO3- δ Films” Y. Xie, M.D. Scafetta, R.J. Sichel-Tissot, E.J. Moon, R.C. Devlin, H. Wu, A.L. Krick, and S.J. May Adv. Mater., vol.26, (2014) 1434 – 1438 (E-14-60)
R-14-16	“X-ray magnetic spectroscopy of MBE-grown Mn-doped Bi2Se3 thin films” L.J. Collins-McIntyre, M.D. Watson, A.A. Baker, S.L. Zhang, A.I. Coldea, S.E. Harrison, A. Pushp, A.J. Kellock, S.S. P. Parkin, G. van der Laan, and T. Hesjedal (OpenAccess) AIP Advances, vol.4, (2014) 127136-1 – 127136-11 (E-14-61)
R-14-17	“Oxygen Vacancy Induced Room Temperature Ferromagnetism in Pr-Doped CeO2 Thin Films on Silicon” G. Niu, E. Hildebrandt, M.A. Schubert, F. Boscherini, M.H. Zoellner, L. Alff, D. Walczyk, P. Zaumseil, I. Costina, H. Wilkens, and T. Schroeder ACS Appl. Mater. Interfaces, vol.6, (2014) 17496 – 17505 (E-14-62)
R-14-18	“Effect of Withdrawal Speed on Film Thickness and Hexagonal Pore-Array Dimensions of SBA-15 Mesoporous Silica Thin Film” J. Hwang, N. Shoji, A. Endo, and H. Daiguji Langmuir, vol.30, (2014) 155550 – 155559 (M-14-57)

2013年

R-13-01	“Strain-induced enhancement of coercivity in amorphous TbFeCo films” N. Anuniwat, M. Ding, S.J. Poon, S.A. Wolf, and J. Lu Jour. Appl. Phys., vol.113 (2013) 043905-1 – 043905-5
R-13-02	“Low temperature high-mobility InZnO thin-film transistors fabricated by excimer laser annealing” M. Fujii, Y. Ishikawa, R. Ishihara, J. van der Cinge, M.R.T. Mofrad, M. Horita, and Y. Uraoka Appl. Phys. Lett., vol.102 (2013) 122107-1 – 122107-4 (M-13-75)
R-13-03	“Growth and electrical properties of AlOx grown by mist chemical vapor deposition” T. Kawaharamura, T. Uchida, M. Sanada, and M. Furuta (OpenAccess) AIP Advances, vol.3 (2013) 032135-1 – 032135-9
R-13-04	“Molecular Reorganization in Organic Field-Effect Transistors and Its Effect on Two-Dimensional Charge Transport Pathways” F. Liscio, C. Albonetti, K. Broch, A. Shehu, S.D. Quiroga, L. Ferlauto, C. Frank, S. Kowarik, R.Nervo, A. Gerlach, S. Milita, F. Schriver, and F. Biscarini ACS Nano, vol.7 (2013) 1257 – 1264
R-13-05	“Optical and mechanical properties of transparent SrTiO3 thin films deposited by ECR ion beam sputter deposition” G. Panomsuwan, O. Takai, and N. Saito Phys. Stat. Solid. -A, vol.210 (2013) 311 – 319 (M-13-91)
R-13-06	“Influence of Oxygen to Argon Ratio on the Structural and Morphological Properties of Nb-Doped SrTiO3 Epitaxial Films Grown by Reactive Ion Beam Sputter Deposition” G. Panomsuwan1, and N. Saito Crystal Str. Theory Appl., vol.2 (2013) 34 – 38 (I-13-04, E-13-30)
R-13-7	“Organic Electronic Devices with Copolymers Based on Naphthalene Diimide Connected with Non Conjugated Flexible Linker” T. Ichimura, K. Fujiwara, T. Kushizaki, T. Kanki, and H. Tanaka Jpn. Jour. Appl. Phys., vol.52 (2013) 05DA15-1 – 05DA15-4 (I-13-07)
R-13-08	“Thermal Boundary Resistance of W/Al2O3 Interface in W/Al2O3/W Three-Layered Thin Film and Its Dependence on Morphology” S. Kawasaki1, Y. Yamashita, N. Oka, T. Yagi, J. Jia, N. Taketoshi, T. Baba, and Y. Shigesato Jpn. Jour. Appl. Phys., vol.52 (2013) 065802-1 – 065802-5
R-13-09	“Atomic layer deposition of high-k dielectrics on carbon nanoparticles” A. Tamm, A.L. Peikolainen, J. Kozlova, H. Mändar, A. Aidla, R. Rammula, L. Aarik, K. Roosalu, J.Lu, L. Hultman, M. Koel, K. Kukli, and J. Aarik Thin Solid Films, vol.538, (2013) 16 – 20 (I-13-17)
R-13-10	“Search for superconductivity in LaNiP2 (P = Bi, Sb) thin films grown by reactive molecular beam epitaxy” J. Kurian, A. Buckow, R. Retzlaff, and L. Alff Physica C, vol.484, (2013) 171 – 174 (E-13-48)
R-13-11	“Characterization of SiGe thin films using a laboratory X-ray instrument” T. Ulyanenkova, M. Myronov, A. Benediktovitch, A. Mikhalychev, J. Halpin and A. Ulyanenkov Jour. Appl. Cryst., vol.46, (2013) 898 – 902 (E-13-51)
R-13-12	“Ambient-Processable High Capacitance Hafnia-Organic Self-Assembled Nanodielectrics” K. Everaerts, J.D. Emery, D. Jariwala, H.J. Karmel, V.K. Sangwan, P.L. Prabhumirashi, M.L. Geier, J.J. McMorrow, M.J. Bedzyk, A. Facchetti, M.C. Hersam, and T.J. Marks Jour. Amer. Chem. Soc., vol.135, (2013) 8926 – 8939
R-13-13	“Microstructures of BPDA-PPD polyimide thin films with different thicknesses” M. Kotera, B.Samyul, K. Araie, Y. Sugioka, T. Nishino, S. Maji, M. Noda, K. Senoo, T. Koganezawa, and I. Hirosawa Polymer, vol.54, (2013) 2435 – 2439 (I-13-25)
R-13-14	“End-On Orientation of Semiconducting Polymers in Thin Films Induced by Surface Segregation of Fluoroalkyl Chains” J. Ma, K. Hashimoto, T. Koganezawa, and K. Tajima Jour. Am. Chem. Soc, vol.135, (2013) 9644 – 9647 (I-13-26)
R-13-15	“On the role of Fe in the growth of single crystalline heteroepitaxial Au thin films on sapphire” D. Amra, and E. Rabkin Acta. Mater., vol.61, (2013) 4113 – 4126 (E-13-56)
R-13-16	“Transport behavior and electronic structure of phase pure VO2 thin films grown on c-plane sapphire under different O2 partial pressure” S. Kittiwatanakul, J. Laverock, D. Newby, Jr., K.E. Smith, S.A. Wolf, and J. Lu Jour. Appl. Phys., vol.114, (2013) 053703-1 – 053703-5 (I-13-28, E-13-60)
R-13-17	“Material design of plasma-enhanced chemical vapour deposition SiCH films for low-k cap layers in the further scaling of ultra-large-scale integrated devices-Cu interconnects” H. Shimizu, S. Nagano, A. Uedono, N. Tajima, T. Momose, and Y. Shimogaki Sci. Technol. Adv. Mater., vol.14, (2013) 055005-1 – 055005-9
R-13-18	“In situ X-ray reflectivity of indium supplied on GaN templates by metal organic vapor phase epitaxy” G. Ju, S. Fuchi, M. Tabuchi, and Y. Takeda Jour. Appl. Phys., vol.114, (2013) 124906-1 – 124906-7
R-13-19	“Insulator-metal transition of VO2 ultrathin films on silicon: evidence for an electronic origin by infrared spectroscopy” W.W. Peng, G. Niu, R. Tétot, B. Vilquin, F. Raimondi, J.B. Brubach, E. Amzallag, T. Yanagida, S.Autier-Laurent, P. Lecoeur and P. Roy Jour. Phys.: Condens. Matter., vol.25, (2013) 445402-1 – 445402-7 (E-13-78)
R-13-20	“Strain induced microstructural and ordering behaviors of epitaxial Fe38.5Pd61.5 films grown by pulsed laser deposition – Review Article” M.A. Steiner, R.B. Comes, J.A. Floro, W.A. Soffa, J.M. Fitz-Gerald, and V.S. Smentkowski Jour. Vac. Sci. Technol.,-A, vol.31, (2013) 050824-1 – 050824-13 (E-13-94)
R-13-21	“Structure of Biodegradable Films at Aqueous Surfaces: X-ray Diffraction and Spectroscopy Studies of Polylactides and Tyrosine-Derived Polycarbonates” W. Wang, N.S. Murthy, I. Kuzmenko, N.A. Anderson, and D. Vaknin Langmuir, vol.29, (2013) 11420 – 11430
R-13-22	“Polymer/metal hybrid multilayers modified Schottky devices” V. Torrisi, F. Ruffino, G. Isgrò, I. Crupi, G.L. Destri, M.G. Grimaldi, and G. Marletta Appl. Phys. Lett., vol.103, (2013) 193117-1 – 193117-5
R-13-23	“Metal-insulator transition in SrTi1-xVxO3 thin films” M. Gu, S.A. Wolf, and J. Lu Appl. Phys. Lett., vol.103, (2013) 223110-1 – 223110-5 (E-13-102)
R-13-24	“Systematic Investigation of Organic Photovoltaic Cell Charge Injection/Performance Modulation by Dipolar Organosilane Interfacial Layers” C.K. Song, A.C. White, L. Zeng, B.J. Leever, M.D. Clark, J.D. Emery, S.J. Lou, A. Timalsina, L.X.Chen, M.J. Bedzyk, and T.J. Marks ACS Appl. Mater. Interfaces, vol.5, (2013) 9224-9240
R-13-25	“Layer-by-Layer Fabrication of Oriented Porous Thin Films Based on Porphyrin-Containing Metal−Organic Frameworks” M.C. So, S. Jin, H.J. Son, G.P. Wiederrecht, O.K. Farha, and J.T. Hupp Jour. Am. Chem. Soc., vol.135, (2013) 15698-15701
R-13-26	“Complex Refractive Index, Specific Heat Capacity, and Thermal Conductivity for Crystalline Sb–Te Alloys and ZnS–SiO2 with Various Compositions at High Temperatures” M. Kuwahara, O. Suzuki, T. yagi, and N. Taketoshi Jpn. Jour. Appl. Phys., vol.52, (2013) 128003-1 – 128003-3
R-13-27	“Ga19Sb81 film for multi-level phase-change memory” P.C. Chang, H.W. Huang, C.C. Chang, S.C. Chang, M.J. Tsai, and T.S. Chin Thin Solid Films, vol.544, (2013) 107 – 1111
R-13-28	“Physical Properties of Amorphous In–Ga–Zn–O Films Deposited at Different Sputtering Pressures” S. Yasuno, T. Kita, A. Hino, S. Morita, K. Hayashi, and T. Kugimiya Jpn. Jour. Appl. Phys., vol.52, (2013) 03BA01-1 – 03BA01-5
R-13-29	“Differencesbetweenamorphousindiumoxidethin films” S. Yasuno, T. Kita, A. Hino, S. Morita, K. Hayashi, and T. Kugimiya Prog. Natur. Sci : Mater International, vol.23, (2013) 475 - 480

2012年

R-12-01	“Thermophysical Properties of Transparent Conductive Nb-Doped TiO2 Films” C. Tasaki, N. Oka, T. Yagi, N. Taketoshi, T. Baba, T. Kamiyama, S. Nakamura, and Y. Shigesato Jpn. Jour. Appl. Phys., vol.51 (2012) 035802-1 – 035802-5
R-12-02	“Benzene substituted with bipyridine and terpyridine as electron-transporting materials for organic light-emitting devices” M. Ichikawa, T. Yamamoto, H.G. Jeon, K. kase, S. Hayashi, M. Nagaoka, and N. Yokoyama Jour. Mater. Chem., vol.22 (2012) 6765 – 6773
R-12-03	“Molecular beam epitaxy growth of BaTiO3 thin films and crucial impact of oxygen content conditions on the electrical characteristics” G. Niu, B. Aautierm S. Yin, G. Saint-Girons, P. Lecoeur, V. Pillard, G. Hollinger, and B. Vilquin Thin Solid Films, vol.520, (2012) 4595 – 4599 (E-12-29)
R-12-04	“Synthesis of Diamond-Like Carbon Films on Planar and Non-Planar Geometries by the Atmospheric Pressure Plasma Chamical Vapor Deposition Method” M. Noborisaka, T. Hirako, A. Shirakura, T. Watanabe, M. Morikawa, M. Seki, and T. Suzuki Jpn. Jour. Appl. Phys., vol.51, (2012) 090117-1 – 090117-7
R-12-05	“Density Profile of Thermal oxide Thin Flms on Si(100)” K. Odaka, A. Kurokawa, Y. Azuma, L. Zhang, and T. Fujimoto Jpn. Jour. Appl. Phys., vol.51, (2012) 091301-1 – 091301-8
R-12-06	“In-Situ Probe of Gate Dielectric-Semiconductor Interfacial Order in Organic Transistors: Origin and Control of Large Performance Sensitivities” S.R. Walter, J. Youn, J.D. Emery, S. Kewalramani, J.W. Hennek, M.J. Bedzyk, A. Facchetti, T.J.Marks, and F.M. Geiger Jour. Am. Chem. Soc., vol.134, (2012) 11726 – 11733 (I-12-13)
R-12-07	“Fabrication and Characterization of Polystyrene Surface with Atomic-Scale Surface Roughness” K. Shimizu, S.Higuchi, A. Kitahara, H. Terauchi, and I. Takahashi (OpenAccess) e-Jour. Surf. Sci. Nanotech., vol.10, (2012) 591 – 593
R-12-08	“Fundamental Performance Limits of Carbon Nanotube Thin-Film Transistors Achieved Using Hybrid Molecular Dielectrics” V.K. Sangwan, R.P. Ortiz, J.M.P. Alaboson, J.D. Emery, M.J. Bedzyk, L.J. Lauhon, T.J. Marks, and M.C. Hersam ACS Nano., vol.6, (2012) 7480 – 7488
R-12-09	“X-ray Reflectivity Study of the Effect of Ion Species on Nanostructure and Its Transition of Poly(styrenesulfonate) Brush at the Air/Water Interface” H. Matsuoka, S. Nakayama, and T. Yamada Chem. Lett., vol.41, (2012) 1060 – 1062
R-12-10	“Determination of optical and microstructural parameters of ceria films” T.S. Oh, Y.S. Tokpanov, Y. Hao, W.C. Jung, and S.M. Haile Jour. Appl. Phys., vol.112, (2012) 103535-1 – 103535-10
R-12-11	“Physical properties and band structure of reactive molecular beam epitaxy grown oxygen engineered HfO2±x” E. Hildebrandt, J. Kurian, and L. Alff Jour. Appl. Phys., vol.112, (2012) 114112-1 – 114112-10 (M-12-206)
R-12-12	“Crystalline Polymorphs of [6,6]-Phenyl‑C61-butyric Acid n‑Butyl Ester (PCBNB)” S.H. Choi, C.D. Liman, S. Krämer, M.L. Chabinyc, and E.J. Kramer Jour. Phys. Chem. B, vol.116 (2012) 13568 – 13574 (I-12-22)
R-12-13	“Anisotropy and densification of polymer ultrathin films as seen by multi-angle ellipsometry and X-ray reflectometry” S. Ata, K. Kuboyama, K. Ito, Y. Kobayashi, and T. Ougizawa Polymer, vol.53 (2012) 1028 – 1033
R-12-14	“Improved reflectivity of platinum/carbon multilayers for X-ray mirrors by carbon doping into platinum layer” J. Kim, H. Yokoyama, S. Matsuyama, Y. Sano, and K. Yamauchi Curr. Appl. Phys., vol.12 (2012) S20 – S23

2011年

R-11-01	“Isobutyl Silane Precursors for SiCH Low-k Cap Layer beyond the 22nm Node: Analysis of Film Structure for Compatibility of Lower k-value and High Barrier Properties” H. Shimizu, N. Tajima, T. Kada, S. Nagano, and Y. Shimogaki Jpn. Jour. Appl. Phys., vol.50 (2011) 05EB01-1 . 05EB01-6
R-11-02	“High-Density Poly(methyl methacrylate) Brushes as Anchoring Surfaces of Nematic Liquid Crystals” M. Tokita, O. Sato, Y. Inagaki, A. Nomura, Y. Tsuji, S. Kang, T. Fukuda, and J. Watanabe Jpn. Jour. Appl. Phys., vol.50 (2011) 071701-1 . 071701-5
R-11-03	“Epitaxial Growth and Characterization of Rocksalt ZnO Thin Films with Low-Level NiO Alloying” S. Katayama, H. Hayashi, F. Oba, and I. Tanaka Jpn. Jour. Appl. Phys., vol.50 (2011) 075503-1 . 075503-5 (E-11-07)
R-11-04	“Tuning of Surface Roughness and Lattice Constant in MgO(111)/Al2O3(0001) Grown by Laser Energy Controlled Pulsed Laser Deposition” S. Kumada, K. Matsuzaki, H. Hosono, and T. Susaki Jpn. Jour. Appl. Phys., vol.50 (2011) 085503-1 . 085503-5 (I-11-05、E-11-10)
R-11-05	“Low-damage milling of an amino acid thin film with cluster ion beam” M. Hada, S. Ibuki, Y. Hontani, Y. Yamamoto, K. Ichiki, S. Ninomiya, T. Seki, T. Aoki, and J. Matsuo Jour. Appl. Phys., vol.110, (2011) 094701-1 – 094701-5 (M-11-85)
R-11-06	“Thermally induced nanoscale structural and morphological changes for atomic-layer-deposited Pt on SrTiO3(001)” Z. Feng, S.T. Christensen, J.W. Elam, B. Lee, M.C. Hersam, and M.J. Bedzyk Jour. Appl. Phys., vol.110, (2011) 102202-1 – 102202-8 (E-11-29)
R-11-07	“Changes in electrical and structural properties of indium oxide thin films through post-deposition annealing” K. Kato, H. Omoto, T. Tomioka, and A. Takamatsu Thin Solid Films., vol.520, (2011) 110 – 116 (M-11-99)
R-11-08	“Solution-Deposited Organic-Inorganic Hybrid Multilayer Gate Dielectrics. Design, Synthesis, Microstructures, and Electrical Properties, with Thin-Film Transistors” Y.G. Ha, J.D. Emery, M.J. Bedzyk, H. Usta, A. Facchetti, and T.J. Marks Jour. Amer. Chem. Soc., vol.133, (2011) 10239 – 10250
R-11-09	“Characterization of Polystyrene Thin Films Using X-Ray Reflectivity” G.L. Monroy, M.J. Bedzykand, and S. Chattopadhya Nanoscope, vol.8, (2011) 18 – 21
R-11-10	“Characterization of group II hafnates and zirconates for metal–insulator–metal capacitors” G. Lupina, O. Seifarth, P. Dudek, G. Kozlowski, J. Dabrowski, H.J. Thieme, G. Lippert, T. Schroeder, and H.J. Müssig Phys. Stat. Solid. -B, vol.248, (2011) 323 – 236 (M-11-145)
R-11-11	“Epitaxial growth of Mn-doped γ-Ga2O3 on spinel substrate” H. Hayashi, R. Huang, F. Oba, T. Hirayama, and I. Tanaka Jour. Mater. Res., vol.26, (2011) 578 – 583 (E-11-44)
R-11-12	“Dipole Layer Formation by Surface Segregation of Regioregular Poly(3-alkylthiophene) with Alternating Alkyl/Semifluoroalkyl Side Chains” Y. Geng, Q. Wei, K. Hashimoto, and K. Tajima Chem. Mater., vol. 23 (2011) 4257 – 4263 (I-11-19)

2010年

R-10-01	“Thermal change of organic light-emitting ALQ3 thin films” M.H. Wang, T. Konya, M. Yahata, Y.Sawada, A. Kishi, T. Uchida, H. Lei, Y. Hoshi, and L.X. Sun J. Therm. Anal. Calorim., vol.99 (2010) 117.122 (I-10-02)
R-10-02	“Effect of Pulsed Substrate Bias on Film Properties of SiO2 Deposited by Inductively Coupled Plasma Chemical Vapor Deposition” T. Hiramatsu, T. Matsuda, H. Furuta, H. Nitta, T. Kawaharamura, C. Li, M. Furuta, and T. Hirao Jpn. Jour. Appl. Phys., vol.49 (2010) 03CA03-1 - 03CA03-4
R-10-03	“Cross-sectional hydrogen content and mass density profiles of diamond-like carbon film by neutron and X-ray reflectivity” K. Ozeki, H. Saitoh, M. Takeda, Y. Ohgoe, K.K. Hirakuri, M. Yonemura, and T. Masuzawa Diamond and Relat. Mater., vol.19 (2010) 489 - 491
R-10-04	“Effect of annealing on the magnetic tunnel junction with Co/Pt perpendicular anisotropy ferromagnetic multilayers” Y. Wang, W.X. Wang, H.X. Wei, B.S. Zhang, W.S. Zhan, and X.F. Han Jour. Appl. Phys., vol.107 (2010) 09C711-1 . 09C711-3
R-10-05	“Laboratory-based characterization of heteroepitaxial structures: Advanced experiments not needing synchrotron radiation” (E-10-08) P. Zaumseil, A. Giussani, and T. Schroeder Powder Diffraction, vol. 25, (2010) 92 . 98
R-10-06	“X-ray thin-film measurement techniques V. X-ray reflectivity measurements” M. Yasaka Rigaku Journal, vol. 26(2), (2010) 1-9
R-10-07	“Thermal Diffusivities of Tris(8-hydroxyquinoline) aluminum and N,N’ -Di(1-naphtyl)-N,N’-diphenylbenzidine Thin Films with Sub-hundred Nanometer Thickness” N. Oka, K. Kato, T. Yagi, N. Taketoshi, T. Baba, N. Ito, and Y. Shigesato Jpn. Jour. Appl. Phys., vol. 49, (2010) 121602-1 . 121602-4
R-10-08	“Field-induced water electrolsis switches an oxide semiconductor from an insulator to a metal” H. Ohta, Y. Sato, T. Kato, S.W. Kim, K. Nomura, Y. Ikuhara, and H. Hosono Natur. Commun., vol. 1, (2010) 118-1 . 118-6
R-10-09	“Effect of deposition temperture on surface morphology and magnetic properties in epitaxial CoFe2O4 thin films deposited by metal organic chemical vapor deposition” M. Pan, G.Bai, Y. Liu, S. Hong, V.P. Dravid, and A.K. Petford-Lang Jour. Appl. Phys., vol. 107, (2010) 043908-1 . 043908-7
R-10-10	“In-situ X-ray reflectivity measurement of polyvinyl acetate thin films during glass transition” M. Mizusawa and K. Sakurai (OpenAccess) IOP Conf. Ser.;Mater. Sci. Eng., vol. 24, (2010) 012013-1 – 012013-5
R-10-11	“Monolayer Charactreization of Amphiphilic Hexa-peri-hexabenzeocoronene Derivatives” C. Akabane, N. kato, and K. Iimura (OpenAccess) IOP Conf. Ser.;Mater. Sci. Eng., vol. 24, (2010) 012023-1 – 012023-7
R-10-12	“N-channel operation of pentacene thin-film transistors with ultrathin polymer gate buffer layer” K. Noda, S. Tanida, H. Kawabata, and K. Matsushige Synth. Metals, vol. 160, (2010) 83 – 87

2009年

R-09-01	“Ｘ線反射率測定入門－第 2章Ｘ線反射率の測定装置と測定方法－” 表和彦講談社サイエンティフィック刊桜井健次編 (2009)
R-09-02	“Effect of Molecular Structure on Depth Profile of Acid Generator Distribution in Chemically Amplified Resist Films” T. Fukuyama, T. Kozawa, K. Okamoto, S. Tagawa, M. Irie, T. Mimura, T. Iwai, J. Onodera, I. Hirosawa, T. Koganesawa, and K. Horie Jpn. Jour. Appl. Phys., vol.48 (2009) 06FC03-1 . 06FC03-3
R-09-03	“Analysis of Amorphous Alumina Thin Film Etching by Phosphate Buffer Using Surface Plasmon Resonance” M. Konishi, N. Gawazawa, S. Kishimoto, S. Ohnishi, H. Akasaki, and H. Saito Jpn. Jour. Appl. Phys., vol.48 (2009) 086502-1 . 086502-4
R-09-04	“薄膜Ｘ線測定法基礎講座第 5回Ｘ線反射率測定” 八坂美穂リガクジャーナル, vol.40, no.2, (2009) 1-9
R-09-05	moved to R-10-3
R-09-06	“Dielectic properties of single crystalline PrO2(111)/Si(111) heterostructures: Amorphous interface and electrical instabilities” O. Seifarth, Ch. Walczyk, G. Lupina, J. Dabrowski, P. Zaumseil, G. Weidner, H.-J. Mussig, and T. Schroeder Jour. Appl. Phys., vol.106 (2009) 104015-1 . 104105-8
R-09-07	“Study of thin-film thickness and density by high-resolution Rutherford backscattering spectroscopy and X-ray reflectivity” A. Kitahara, S. Yasuno, and K. Fujisawa Trans. Mater. Res. Soc. Jpn., vol.34 (2009) 613-615
R-09-08	“Band gap enhancement and electrical properties of La2O3 films doped with Y2O3 as high-k gate insulators” Y. Zhao, K. Kita, K. Kyuno, adn A. Toriumi Appl. Phys. Lett., vol.94 (2009) 042901-1 – 042901-3
R-09-09	“Structure and defects of epitaxial Si(111) layers on Y2O3(111)/Si(111) support systems” C. Borschel, C. Ronning, H. Hofsäss, A. Giussani, P. Zaumseil, Ch. Wenger, P. Storck, T. Schroeder J. Vac. Sci. Technol. B, vol. 27, (2009) 305 – 309 (E-09-15)
R-09-10	“Thermal oxidation of chemical vapour deposited tungsten layers on silicon substrates for embedded non-volatile memory application” R. Sohal, C. Walczyk, P.Zaumseil, D. Wolansky, A. Fox, B. Tillack, H.J. Müssig, and T. Schroeder Thin Solid Films, vol. 517, (2009) 4534 – 4539 (M-09-46)

2008年

R-08-01	“X-ray Reflectivity Study on Depth Profile of Acid Generator Distribution in Chemically Amplified Resists” T. Fukuyama, T. Kozawa, S. Tagawa, R. Takasu, H. Yukawa, M. Sato, J. Onodera, I. Hirosawa, T. Koganezawa, and K. Horie Appl. Phys. Express, vol.1 (2008) 065004-1 - 065004-3
R-08-02	“Large enhancement of the thermoelectric Seebeck coefficient for amorphous oxide semiconductor superlattices with extremely thin conductive layers ” H. Ohta, R. Huang, and Y. Ikuhara Phys. Stat. Solidi, (PRL), vol.2 (2008) 105-107
R-08-03	“Nucleation, Expansion and Compression of Y2O3 nano-crystals : Crystallogenesis in Annealing Process of Metalorganic Decomposition Method” M. Ishii, A. Nakao, and K. Sakurai Trans. Mater. Res. Soc. Jpn., vol.33, (2008) 583-586 (same article with I-08-13)
R-08-04	“Characterization of copper selenide thin film hole-injection layers deposited at room temperature for use with p-type organic semiconductors” H. Hiramatsu, I. Koizumi, K.B. Kim, H. Yanagi, T. Kamiya, M. Hirano, N. Matsunami, and H. Hosono Jour. Appl. Phys., vol.104, (2008) 113723-1 . 113723-8
R-08-05	“Epitaxial growth of GaN films grown on single crystal Fe substrates” K. Okamoto, S. Inoue, N. Matsuki, T.W. Kim, J. Ohta, M. Oshima, H. Fujioka, and A. Ishii Appl. Phys. Lett., vol.93, (2008) 251906-1 . 251906-3
R-08-06	“Engineering the semiconductor/oxide interaction for stacking twin suppression in single crystalline epitaxial silicon(111)/insulator/Si(111) heterostructures” T Schroeder, P Zaumseil, O Seifarth1, A Giussani,H-J Mussig, P Storck, D Geiger, H Lichte and J Dabrowski (same article with I-08-27, E-08-21) (OpenAccess) New Jour. Phys., vol.10, (2008) 113004-1 . 113004-21
R-08-07	“Hydrogenated amorphous silicon a-Si:Hx/a-Si:Hy compositional superlattices: profiling the lattice-constant-scale spatial change of the designed Si-H bonding configurations” Y.L. Jiang, P.T. Shih, and T.C. Kuo Appl. Phys. Lett., vol.92, (2008) 101915-1 – 101915-3
R-08-08	“Double-layer porous TiO2 electrodes for solid-state dye-sensitized solar cells” X. Fan, D.P. Demaree, J.M.St. John, A. Tripathi, and S.R.J. Oliver Appl. Phys. Lett., vol.92, (2008) 193108-1 – 193108-3
R-08-09	“Evaluating the Optical Index of Ta and Ta-Based Absorbers for an Extreme Ultraviolet Mask Using Extreme Ultraviolet Reflectometry” M. Hosoya, N. Sakaya, O. Nozawa, Y. Shiota, K. Hamamoto, O. Nagarekawa, S. Shimojima, T. Shoki, T. Watanabe, and H. Kinoshita Jpn. Jour. Appl. Phys., vol.47, (2008) 4898 – 4905
R-08-10	“Ｘ線反射率測定を用いた有機シランSAM の評価” 山内悠・野村聡京大ナノ支援装置利用報告, -, (2008) H-19-017
R-08-11	“Ｘ線表面散乱法による生体分子薄膜の構造評価” 桑島修一郎・大村英治・山田啓文・松重和美京大ナノ支援装置利用報告, -, (2008) H-19-014
R-08-12	“Fabrication for multilayered composite thin films by dual-channel vacuum arc deposition” H. Dai, Y. Shen, J. Wang, M. Xu, L. Li, X. Li, X. Cai, and P.K. Chu Rev. Sci. Instrum, vol.79, (2008) 065104-1 – 065104-5
R-08-13	“The effective interdiffusivity, structure, and magnetic properties of [Fe/Pt]n multilayer films” B. Yao, and K.R. Coffey Jour. Appl. Phys., vol.103, (2008) 07E107-1 – 07E107-3

2007年

R-07-01	“Contact Printed Co/SAM/Co Molecular Junctions” X. Fan, D.L. Rogow, C.H. Swanson, A. Tripathi, and S.R.J. Oliver Appl. Phys. Lett., vol.90 (2007) 163114-1-163114-3 (same article with I-07-05)
R-07-02	“Langmuir-Blodgett Films of a Mo-Blue Nanoring [Mo142O429H10(H2O)49(CH3CO2)5(CH3CH2CO2)]30- Mo142) by the Semiamphiphilic Method” M. Clemente-Leon, T. Ito, H. Yashiro, T. Yamase, and E. Coronado Langmuir, vol.23, (2007) 4042-4047
R-07-03	“Two-Dimensional Array of Polyoxomolybdate Nanoball Constructed by Langmuir-Blodgett Semiamphiphilic Method” M. Clemente-Leon, T. Ito, H. Yashiro, and T. Yamase Chem. Mater., vol.19, (2007) 2589-2549
R-07-04	“Growth temperature dependence of structural properties of AlN films on ZnO(000 1) substrates” K. Ueno, A. Kobayashi, J. Ohta, and H. Fujioka Appl. Phys. Lett., vol.90, (2007) 141908-1 . 141908-3 (same article with E-07-11)
R-07-05	“Low temperature epitaxial growth of GaN films on LiGaO2 substrates” K. Sakurada A. Kobayashi, Y. Kawaguchi, J. Ohta, and H. Fujioka Appl. Phys. Lett., vol.90, (2007) 211913-1 . 211913-3
R-07-06	“Direct Evaluation of Surface Roughness of Substrate and Interfacial Roughness in Molybdenum/Silicon Multilayers Using Extreme Ultraviolet Reflectmeter” M. Hosoya, N. Sakaya, O. Nozawa, Y. Shiota, S. Shimojima, T. Shoki, T. Watanabe, and H. Kinoshita Jpn. Jour. Appl. Phys., vol.46, (2007) 6128-6134
R-07-07	“Structural Characterization of 4-Bromostyrene Self-Assembled Monolayers on Si(111)” R. Basu, J.C. Lin, C.Y. Kim, M.J. Scmitz, N.L. Yoder, J. A. Kellar, J. Bedzyk, and M.C. Hersam Langmuir, vol.23, (2007) 1905-1911
R-07-08	“Structura analysis of amphiphilic di-block copolymer monolayer by X-ay reflectivity” T. Yamada, S. Jung, and H. Yoshida (OpenAccess) Jour. Phys.: Conf. Ser., vol.83 (2007) 012005-1 - 012005-4 (I-07-20)
R-07-09	“Application of X-ray reflectivity measurement to monitoring of chemical reactions at ‘buried’interface” M. Ishii, A. Nakao, and K. Sakurai (OpenAccess) Jour. Phys.: Conf. Ser., vol.83 (2007) 012014-1 - 012014-5 (I-07-21)
R-07-10	“Growth of crystalline γ-Al2O3 on Si by molecular beam epitaxy: Influence of the substrate orientation” C. Merckling, M. El-Kazzi, G. Saint-Girons, G. Hollinger, L. Largeau, G. Patriarche, V. Favre-Nicolin, and O. Marty Jour. Appl. Phys., vol.102 (2007) 024101-1 – 024101-6 (I-07-27,E-07-46)

2006年

R-06-01	“Regular Two-Dimensional Molecular Array of Photoluminescent Anderson-type Polyoxometalate Constucted by Lagnmuir-Blodgett Technique” T. Ito, H. Yashiro, and T. Yamase Langmuir, vol.22, (2006) 2806-2810
R-06-02	“Epitaxial growth of AlN on single-crystal Ni(111) substrates” T.W. Kim, N. Matsuki, J. Ohta, and H. Fujioka Appl. Phys. Lett., vol.88, (2006) 121916-1 . 121916-3
R-06-03	“Low temperature epitaxial growth of In0.25Ga0.75N on lattice-matched ZnO by pulsed laser deposition” A. Kobayashi, J. Ohta and H. Fujioka Jour. Appl. Phys., vol.99, (2006) 123513-1 . 123513-4 (E-06-26)
R-06-04	“Ｘ線反射率による膜構造測定における不確かさ ” 表和彦・伊藤義泰表面科学, vol.27, (2006) 642-648
R-06-05	“Photooxidation of plasma polymerized polydimethylsiloxane film by 172nm vacuum ultraviolet light irradiation in dilute oxygen” S. Ichikawa Jour. Appl. Phys., vol.100, (2006) 033510-1 – 033510-5
R-06-06	“Epitaxial Growth of Ordered Co2(Cr1-xFex)Al Full-Heusler Alloy Films on Single Crystal Substrates” S. Okamura, A. Miyazaki, N. Tezuka, S. Sugimoto, and K. Inomata Appl. Phys. Lett., vol.89, (2006) 252508-1 – 252508-3 (I-06-27, E-06-40)

2005年

R-05-01	“種々の N濃度を有するα’及びγ’-Fe-N相の合成と磁気モーメント” 須永和晋・角田匡清・高橋研日本応用磁気学会誌., vol.29, (2005) 553-557
R-05-02	“low-k SiOCH Film Deposited by Plasma-Enhanced Chemical Vapor Deposition Using Hexamethyldisiloxane and Water Vapor” Y. Shioya, H. Shimoda, K. Maeda, T. Ohdaira, R. Suzuki, and Y. Seino Jpn. Jour. Appl. Phys., vol.44, (2005) 553-557
R-05-03	“Effects of growth conditions on structure of organosilane monolayers on SiO2 substrates” N. Yoshimoto,M. Maruyama, T. Nishikawa, Y. Iwasa, T. Shimoda, and S, Ogawa Mol. Cryst. Liq. Cryst., vol.445, (2005) 49-55
R-05-04	“Thermal Expansion of Low Dielectric Constant Thin Films by High-Resolution X-Ray Reflectivity” K. Omote, and Y. Ito Mater. Res. Soc. Symp. Proc., vol.875, (2005) O8.2.1-
R-05-05	“Kinetic Model of Si Oxidation at HfO2/Si Interface with Post Deposition Annealing” H. Shimizu, K. Kita, K. Kyuno, and A. Toriumi Jpn. Jour. Appl. Phys., vol.44, (2005) 6131-6135
R-05-06	“Microstructural comparisons of ultrathin Cu films deposited by ion-beam and dc-magnetron sputtering” W.L. Prater, E.L. Allen, W.Y. Lee, M.F. Toney, A. Kellock, J.S. Daniels, J.A. Hedstrom, and T. Harrell Jour. Appl. Phys., vol.97, (2005) 093301-1 . 093301-9
R-05-07	“Physical structures of SiO2 ultrathin films probed by grazing incident x-ray reflectivity” Y. Azuma, J. Fan, I. Kojima, and S. Wei Jour. Appl. Phys., vol.97, (2005) 123522-1 . 123522-5

2004年

R-04-01	“Room Temperature Layer by Layer Growth of GaN on Atomically Flat ZnO” A. Kobayashi, H. Fujioka, J. Ohta, and M. Oshima Jpn. Jour. Appl. Phys., vol.43, (2004) L53-L55
R-04-02	“Control of carrier density by self-assembled monolayers in organic filed-effect transistors” S. Kobayashi, T. Nishikawa, T. Takenobu, S. Mori, T. Shimoda, T. Mitani, H. Shimotani, N. Yoshimoto, S. Ogawa, and Y. Iwasa Nature Materials, vol.3, (2004) 317-322
R-04-03	“Ｘ線反射率による薄膜の熱膨張率測定 ” 表和彦 KEK Proceedings 2004-5, (2004) 47-48

2003年

R-03-01	“応用磁気における計測の実際 V -Ｘ線回折法による磁気薄膜の最新評価技術-” 松尾隆二「日本応用磁気学会誌. , 27巻（2003）ｐ.34-39
R-03-02	“Al2O3 formation on Si by catalytic chemical vapor deposition” Y. Ogita, S Iehara, and T Tomita Thin Solid Films , vol.430, (2003) 161-164

2002年

R-02-01	“Boundary Structure of Mo/Si Multilayers for Soft X-ray Mirrors” M. Ishino, O. Yoda, Y. Haishi, F. Arimoto, M. Takeda, S. Watanabe, S. Ohnuki, and H. Abe Jpn. Jour. Appl. Phys. , vol.41, (2002) 3052-3056
R-02-2	“Characterization of hetero-interfaces between group III nitrides formed by PLD and various substrates” J. Ohta, H. Fujioka, H. Takahashi and M. Oshima Appl. Surf. Sci., vol.190, (2002) 352-355

2001年

R-01-01	“X-ray diffraction and reflectivity analysis of GaAs/InGaAs free-standing trapezoidal quantum wires” A. Ulyanenkov, K. Inaba, P. Mikulik, N. Darowski, K. Omote, U. Pietsch, J. Grezner, and A.Forchel Jour. Phys. D:Appl. Phys., vol.34, (2001) 1-4
R-01-02	“Role of oxygen in the film growth and giant magnetresistance of Co/Cu multilayers” S. Miura, M. Tsunoda, and M. Takahashi Jour. Appl. Phys., vol.89, (2001) 6308-6313
R-01-03	“Cr/Sc Multilayer Mirror for Soft-X-ray” T. Ohuchi, T. Fujimoto, and I. Kojima Anal. Sci., vol.89, (2001) i159-i162

2000年

R-00-01	“X-ray scattering study of interfacial roughness correlation in Mo/Si multilayers fabricated by ion beam sputtering” A. Ulyanenkov, R. Matsuo, K. Omote, K. Inaba, J. Harada, M. Ishino, M. Nishii, and O. Yoda Jour. Appl. Phys., vol. 87, (2000) 7255-7260
R-00-02	“Stabilization of ZrSixOy Films by Irradiation with an ArF Excimer Laser” K. Nakazawa, T. Matsuo, T. Onodera, T. Ogawa, and H. Morimoto Jpn. Jour. Appl. Phys., vol.39, (2000) 561-4566
R-00-03	“The Evaluation of Structure Parameters of a Mo/Si Superlattice using X-ray Scattering Data and a Genetic Algorithm” A.Ulyanenkov, K. Omote, and J. Harada Advances in X-ray Analysis, vol. 43, (2000) 185-191
R-00-04	“The Genetic Algorithm : Refinement of X-ray Reflectivity Data from Multilayers and Thin Films” A. Ulyanenkov, K. Omote, and J. Harada Physica, B,vol.283, (2000) 273-241
R-00-05	“Ｘ線反射率測定の気水界面単分子膜への応用” 籠恵太郎・毛利恵美子・松岡秀樹・山岡仁史表面科学, vol.21, (2000) 615-622

1999年

R-99-01	“Specular and non-specular x-ray scattering study of SiO2/Si structures” A. Ulyanenkov, K. Omote, R. Matsuo, and S-Y. Matsuno J. Phys. D., vol. 32, (1999) 1313-1318
R-99-02	“High resolution thickness measurements and evaluation of a photomask blank” T. Hirano, R. Matsuo, K. Tomiyama, I. Yazawa, H. Wada, M. Otaki, and K. Omote Proc. 19th Annual Bacus Symposium on Photomask Technology, (1999) 562-572
R-99-03	“An X-ray reflectivity study of surface layering in a magnetic fluid” I. Takahashi, K. Ueda, Y. Tsukahara, A. Ichimiya, and J. Harada The Rigaku Journal, vol. 16, no.1, (1999) 32-37
R-99-04	“Structural characterizationof thin films by X-ray reflectivity” I. Kojima and B. Li The Rigaku Journal, vol. 16, no.2, (1999) 31-42
R-99-05	“Ｘ線反射率法による薄膜の精密構造評価” 小島勇夫「理学電機ジャーナル」vol.30、（1999）4-10
R-99-06	“High resolution thickness and interface roughness characterization in multilayer thin films by grazing incidence X-ray re¯ectivity” I. Kojima, B. Li, and T. Fujimoto Thin Solid Films, vol.355-356, (1999) 385-389

1997年

R-97-01

“Recent Theoretical models ingrazing incidence X-ray reflectometry”
K. Stoev and K. Sakurai
The Rigaku Journal, vol. 14, no.2, (1997) 22-37

R-2	“Physical structures of SiO2 ultirathin films probed by grazing incidence X-ray reflectivity” Y. Azuma, J. Fan, I. Kojima, and S. Wei Jour. Appl. Phys., vol.97, (2005) 123522-1 . 1235225-5 (R-05-7)
R-3	“Ｘ線反射率法を用いた SIトレーサブルな膜厚評価 -試料表面形状評価による不確かさ低減効果-” 藤本俊幸・山岸秀一・東康史・高辻利之・渡部司表面科学 vol.28（2007）494-499
R-4	“Ｘ線反射率法の応用について -薄膜・多層膜の埋もれた層・界面の密度、膜厚、ラフネスの決定-” 桜井健次応用物理 vol.78（2009）224-230
R-5	“シリコン酸化膜の構造遷移層の密度分布解析” 黒河明・尾高憲二・藤本俊幸・東康史真空（Jour. Vac. Soc. Jpn.）vol.50, (2007) 199-201
R-6	“X-ray reflectivity and total reflection x-ray fluorescence study of surface oxide evolution in a GaAs/AlAs multilayer system” P. Colombi, E. Bontempi, L. Depero, Y. Azuma, and T. Fujimoto Jour. Appl. Phys., vol.105, (2009)014307-1 . 014307-5
R-7	“Ｘ線反射率法による表面層解析における密度傾斜効果のシミュレーション” 水沢まり・桜井健次Ｘ線分析の進歩 vol.33, (2002) 175-184
R-8	“微小角入射Ｘ線散乱法を利用した薄膜表面層構造評価” 藤居義和まてりあ, vol.48, (2009) 445-451
R-9	“Ｘ線・放射光反射および回折による薄膜材料評価技術” 木村滋応用物理, vol.79, (2010) 302-306

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